Recycling a slurry for reuse in chemical mechanical planarization of tungsten wafer: Effect of chemical adjustments and comparison between static and dynamic experiments

Testa, Fabrice; Coetsier, Clémence; Carretier, Émilie; Ennahali, M.; Laborie, Bernard; Moulin, Philippe

doi:10.1016/j.mee.2013.07.022

Cited by 12 publications

(4 citation statements)

References 36 publications

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“…UF allows to concentrate macromolecular solutions and to remove particles with size ranging from 0.002 to 0.1 m, including most of the silica colloids and NPs present in CMP wastewater (Tsai et al, 2007). It should be also noted that the reuse, recycling, or reclamation of the CMP wastewater is becoming an important issue because of the high amount of ultrapure water that is required by semiconductor industry (Testa et al, 2011(Testa et al, , 2014. Therefore, UF may represent a suitable solution to: (i) remove slurry par-ticles, and to (ii) reuse the purified CMP wastewater after the UF treatment.…”

Section: Nomenclature Amentioning

confidence: 99%

Dead-end and crossflow ultrafiltration process modelling: Application on chemical mechanical polishing wastewaters

Ohanessian

Monnot

Moulin

et al. 2020

Chemical Engineering Research and Design

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HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

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Section: Nomenclature Amentioning

confidence: 99%

Dead-end and crossflow ultrafiltration process modelling: Application on chemical mechanical polishing wastewaters

Ohanessian

Monnot

Moulin

et al. 2020

Chemical Engineering Research and Design

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“…Increasing interest is given to the possibility of reusing exhaust slurries, which is currently difficult simply due to the impossibility of adequately characterizing these materials. The slurry market for applications less demanding than nanoelectronic fabs could be fruitfully integrated by introducing reused slurries, once properly characterized (Seo, 2007;Testa, 2011;Testa, 2014).…”

Section: Discussionmentioning

confidence: 99%

Optical Characterization of Industrial Slurries

Potenza

Sanvito

Fazio

2016

KONA

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In this work we focus on the characterization of micro-and nano-powders typically adopted for chemical mechanical polishing, extensively used whenever the global and local planarization of surfaces is required as in nanoelectronic fabs. We present an innovative method for the accurate characterization of water suspensions of nanoparticles. It relies upon the combination of a new approach to extract light-scattering information from single particles and the recently developed diagnostic tool named Single Particle Extinction and Scattering. It can be used in line. Data interpretation becomes independent of any a-priori assumptions about the samples. The results of accurate measurements performed on ceria as well as aluminium oxide slurries are reported. We show the strong advantages of this method compared with traditional ones by explicitly reporting experimental results on calibrated spheres made of different materials. We discuss possible applications for in-line characterization of ultrapure water, chemicals, slurries for abrasive processes, for example, as well as the detection of any undesired particles-which could be the key for future improvements to advanced process control systems.

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“…Integrating this method within the process and quality control protocols at fabs employing slurries could determine huge advantage from many respects. Increasing interest is given from industry to characterize exhaust slurries, which can be affected by the presence of contaminants, aggregates, and emulsions, but they could even be reused for many applications instead of wasting (Seo 2007;Testa et al 2011Testa et al , 2014.…”

Section: Discussionmentioning

confidence: 99%

Accurate sizing of ceria oxide nanoparticles in slurries by the analysis of the optical forward-scattered field

Potenza

Sanvito²,

Pullia

2015

J Nanopart Res

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We characterize slurries composed of ceria nanoparticles in the range of 100-400 nm by exploiting a new approach which makes the data interpretation independent of any a priori assumption about the sample and provides very accurate and precise measurement of the particle size distribution, irrespectively of the huge polydispersity. The complex field scattered by single particles is determined by simultaneous measurements of the extinction cross section and the forward-scattered field amplitude. Moreover, we show how this approach overcomes typical issues encountered with this kind of suspensions such as the presence of aggregates, spurious components, and gas bubbles, at variance with any other method for measuring single particles. Applications are discussed.

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Recycling a slurry for reuse in chemical mechanical planarization of tungsten wafer: Effect of chemical adjustments and comparison between static and dynamic experiments

Abstract: Recycling a slurry for reuse in chemical mechanical planarization of tungsten wafer: Effect of chemical adjustments and comparison between static and dynamic experiments. (2014) Microelectronic Engineering, 113. 114-122.

Cited by 12 publications

References 36 publications

Dead-end and crossflow ultrafiltration process modelling: Application on chemical mechanical polishing wastewaters

Dead-end and crossflow ultrafiltration process modelling: Application on chemical mechanical polishing wastewaters

Optical Characterization of Industrial Slurries

Accurate sizing of ceria oxide nanoparticles in slurries by the analysis of the optical forward-scattered field

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