Rectangular-apertured micro-Fresnel lens arrays fabricated by electron-beam lithography

Shiono, Teruhiro; Setsune, Kentaro; Yamazaki, Osamu; Wasa, Kiyotaka

doi:10.1364/ao.26.000587

Cited by 68 publications

(21 citation statements)

References 2 publications

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“…Because the field is relatively small and mostly limited to astronomical purposes, components for the field are manufactured typically only in small quantities and are expensive. While some vendors use classic lithography techniques 1 , thin film deposition 2 , or machine milling to get the pattern needed, we are exploring the use of the Maskless Lithography Tool (MLT) developed at the University of Arizona to quickly and simply develop a range of products, both old and new, for the field. Thus far our research has focused on generating phase screens representative of Kolmogorov turbulence and generating lenslet arrays.…”

Section: Introductionmentioning

confidence: 99%

Lithographic manufacturing of adaptive optics components

Scott

Jean

Johnson

et al. 2017

Astronomical Optics: Design, Manufacture, and Test of Space and Ground Systems

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Adaptive optics systems and their laboratory test environments call for a number of unusual optical components. Examples include lenslet arrays, pyramids, and Kolmogorov phase screens. Because of their specialized application, the availability of these parts is generally limited, with high cost and long lead time, which can also significantly drive optical system design. These concerns can be alleviated by a fast and inexpensive method of optical fabrication. To that end, we are exploring direct-write lithographic techniques to manufacture three different custom elements. We report results from a number of prototype devices including 1, 2, and 3 wave Multiple Order Diffractive (MOD) lenslet arrays with 0.75 mm pitch and phase screens with near Kolmogorov structure functions with a Fried length r 0 around 1 mm. We also discuss plans to expand our research to include a diffractive pyramid that is smaller, lighter, and more easily manufactured than glass versions presently used in pyramid wavefront sensors. We describe how these components can be produced within the limited dynamic range of the lithographic process, and with a rapid prototyping and manufacturing cycle. We discuss exploratory manufacturing methods, including replication, and potential observing techniques enabled by the ready availability of custom components.

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Section: Introductionmentioning

confidence: 99%

Lithographic manufacturing of adaptive optics components

Scott

Jean

Johnson

et al. 2017

Astronomical Optics: Design, Manufacture, and Test of Space and Ground Systems

View full text Add to dashboard Cite

show abstract

“…However, due to the fluctuations of the exposure energy, the temperature and the solvent concentration, the repeatability and stability of the processing were reduced during the lithography and heating. Electron beam lithography (EBL) and ion beam lithography (IBL) can obtain the arbitrary patterns, but the high cost and the low production efficiency restrict the industrial applications of the technologies [9,10]. Laser interference lithography can also be used to produce the periodic micro structures, but the intensity distributions of the interference patterns restricts the aspect ratio of the microstructures, and it is not suitable for micro-lens arrays [11][12][13].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Hydrophobic Micro-lens Arrays by Capillary Force Lithography

Xu¹,

Xu²,

Wang³

et al. 2017

dteees

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Abstract. This paper presents a method based on the capillary force lithography technology to fabricate the micro-lens arrays. The micro-lens arrays characterized with hydrophobic were obtained by combining this capillary force lithography and photolithography. In the method, the PDMS is used as an elastomeric mold that has a planar surface with the negative concave micro-lens structures by casting PDMS against a complementary relief structure prepared by photolithography. The imaging and the hydrophobic performances of the micro-lens array are achieved during the experiments, and the maximum contact angle reaches 124° approximately. This technology is suitable for applications required a self-cleaning surface such as image sensors and detectors operating under the natural conditions.

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“…Diffractive flat micro-lenses are essentially phase masks which shape optical wavefronts. Several approaches based on multilevel Fresnel structures [1][2][3][4][5][6][7], effective medium structures [8][9][10][11][12], plasmonic metasurfaces [13][14][15][16][17][18][19], and high contrast aperiodic gratings [20][21][22][23] have been used for achieving wavefront control. Multilevel Fresnel structures approximate a continuous thickness variation corresponding to a desired phase profile, by a limited number of steps.…”

Section: Introductionmentioning

confidence: 99%

Efficient high NA flat micro-lenses realized using high contrast transmitarrays

et al. 2015

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We present design, fabrication, and characterization results of high numerical aperture (NA) micro-lenses based on a high contrast transmitarray platform. The high contrast transmitarray is created by periodic arrangement of amorphous silicon posts with different diameters on a fused silica substrate. We report near infrared high NA micro-lenses with spot sizes as small as 0.57λ and focusing efficiencies in excess of 80%. We demonstrate a trade-off relation between NA and efficiency of high contrast array flat micro-lenses, and attribute it to the spatial discretization of their phase profiles.

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Rectangular-apertured micro-Fresnel lens arrays fabricated by electron-beam lithography

Cited by 68 publications

References 2 publications

Lithographic manufacturing of adaptive optics components

Lithographic manufacturing of adaptive optics components

Fabrication of Hydrophobic Micro-lens Arrays by Capillary Force Lithography

Efficient high NA flat micro-lenses realized using high contrast transmitarrays

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