Interference in the Fresnel regime of periodic structures creates a wide variety of intricate diffraction patterns. The diffraction patterns from both amplitude and phase gratings can bear a strong resemblance to the grating itself, or have much more complex structures. In this paper, we discuss a general approach for using interference patterns from amplitude gratings for lithographic fabrication of optical microstructures. We address the generation of the interference patterns from the standpoint of Talbot self-imaging. This approach enables the realization of complex optical structures with a single exposure in an appropriate fractional Talbot plane. Design approaches are discussed, and both theoretical and experimental results are presented.