1995
DOI: 10.1103/physrevb.51.14721
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Reconstruction of the GaAs (311)Asurface

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Cited by 125 publications
(93 citation statements)
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“…25͒ suggest a significantly smaller corrugation height of about 2 ML. This surface re-construction, which is consistent with the electron counting model, 25,26 can lead to the reported 13 RHEED signal, as was shown by a kinematical simulation. 27 Recently, da Silva et al also estimated the interface corrugation height to be 2 ML by the splitting of the confined optical phonons.…”
Section: Introductionsupporting
confidence: 68%
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“…25͒ suggest a significantly smaller corrugation height of about 2 ML. This surface re-construction, which is consistent with the electron counting model, 25,26 can lead to the reported 13 RHEED signal, as was shown by a kinematical simulation. 27 Recently, da Silva et al also estimated the interface corrugation height to be 2 ML by the splitting of the confined optical phonons.…”
Section: Introductionsupporting
confidence: 68%
“…29 On the other hand, there is evidence for an interface corrugation with a period of 3.2 nm along the ͓110͔ direction inside these SL's by Raman experiments, 21,22,28 consistent with the RHEED image of the surface in ͓332͔ incidence during the growth. 13 The interface corrugation within the SL's is thus most likely given by the surface reconstruction of ͑113͒ GaAs proposed by Wassermeier et al, 25,26 showing only 2-ML corrugation height.…”
Section: Photoluminescencementioning
confidence: 99%
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“…[5][6][7] The other stable high-index surface, the ͑113͒A orientation, results from a very complex arrangement of the same structural units, the so-called ͑8 ϫ 1͒ reconstruction. 8,9 Here, we employ density-functional theory ͑DFT͒ calculations to investigate the elementary growth processes on InAs͑137͒A. Since this surface contains already all structural motifs of the more complex ͑2 5 11͒A and ͑113͒A͑8 ϫ 1͒ surfaces, it may serve as an example to study adsorption, surface diffusion, and nucleation on high-index substrates.…”
Section: Introductionmentioning
confidence: 99%