Recent progress in filtered vacuum arc deposition

Boxman, R.L.; Zhitomirsky, V.N.; Alterkop, B.; Gidalevich, E.; Beilis, I. I.; Keidar, Michael; Goldsmith, S.

doi:10.1016/s0257-8972(96)03023-x

Cited by 155 publications

(73 citation statements)

References 64 publications

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“…Martin et al [86] conclude that the filtering system with a magnetic plasma duct is the most effective method of producing macroparticle-free coatings. The Aksenov toroidal-type filter in Figure 4.4 is one of the most practical and popular designs [87]. …”

Section: Filtering Systemsmentioning

confidence: 99%

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Yang

Tieu

Dunne

et al. 2009

Wear

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AcknowledgementsFirst and foremost, I would like to thank my principal supervisor, Professor A. Kiet.Tieu., for providing timely and insightful advice, financial and spiritual support. My supervisor's implicit trust in my research abilities not only allowed me to freely pursue my goals, but also gave me an opportunity to learn how to manage time and allocate resources. Special thanks go to Professor Druce Dunne, for his insightful instruction and for all the generous attention and time he devoted to my research work. Tables Table 5. List of List of Figures AbstractThe objective of this work was to produce near-equiatomic NiTi thin films by filtered arc deposition system (FADS) to improve the cavitation erosion resistance of a steel base working in liquid. First, deposition conditions were optimized in order to obtain near-equiatomic NiTi films. Energy dispersive spectroscopy (EDS) was used to measure the composition of films. It was found that both the substrate bias voltage and arc current affect the compositions of as-deposited NiTi films. X-ray diffractometry (XRD) and transmission electron microscopy (TEM) were used to investigate the microstructures of Ni-rich, Ti-rich and near-equiatomic films. Their thermal behaviours were tested using differential scanning calorimetry (DSC). Atomic force microscopy (AFM), ultra micro-indentation system (UMIS) and Romulus scratch testing were used to measure the roughness, hardness and adhesive force of a near-equiatomic thin film.The cavitation erosion resistance of the near-equiatomic NiTi film was assessed using ASTM Test Method G32. It was found that NiTi thin films showed significantly higher cavitation erosion resistance than 316 austenitic stainless steel. The improved cavitation erosion resistance was attributed to the recoverable deformation associated with pseudoelasticity of the NiTi thin film.The effect of substrate temperature on the properties of NiTi thin films was investigated by preheating substrates to different temperatures (130 C, 300 C, 430 C and 600 C). temperature of 600 C was more resistant to cavitation erosion than films deposited at other bias voltages with a similar substrate temperature.The effect of substrate material on the properties of NiTi thin films was investigated by comparing films on mild steel and on austenitic stainless steel. For similar deposition conditions, the NiTi film deposited on mild steel consisted of B2, B19' and R phases, while the NiTi film on stainless steel was dominated by B2 parent phase. This is probably because the lower thermal conductivity of austenitic stainless steel resulted in a higher deposition temperature.The dominance of the B2 phase for deposition with a high substrate temperature, a high bias voltage and the use of stainless steel substrate was not found to be due to Ni-enrichment of the films, but is consistent with stabilization of the parent phase by possible pick-up oxygen and nitrogen from the chamber atmosphere when the deposition temperature is high.The research program successfully pro...

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Section: Filtering Systemsmentioning

confidence: 99%

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Yang

Tieu

Dunne

et al. 2009

Wear

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“…[2][3][4]9 Among the successful methods for preparing ta-C films, the FCVA technique is of particular interest for industrial applications because it provides highly ionized plasma of energetic carbon ions, from which dense films of amorphous carbon can be grown at reasonable deposition rates, at lower temperature on inexpensive substrates including glass and plastics over large area. 10 The cathodic arc uses relatively low voltage and high current density of discharge, in which the macroscopic fragments of the cathode material are also emitted. Electromagnetic deflection of the plasma through L bend ͑90°͒ using a a͒ Author to whom correspondence should be addressed; electronic mail: ospanwar@mail.nplindia.ernet.in curved solenoid was first used to remove the macro particles from the carbon plasma by Aksenov et al 11 The macroparticle filter, on the other hand, has limited transport efficiency and tends to collimate the plasma, leading to a restricted area of deposition.…”

Section: Introductionmentioning

confidence: 99%

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Panwar

Khan

Satyanarayana³

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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This article reports the influence of substrate bias during growth and of hydrogen and nitrogen incorporation on density of states ͓N ͑E F ͔͒ and field-emission threshold ͑E turn-on ͒ in tetrahedral amorphous carbon ͑ta-C͒ films, deposited using an S-bend filtered cathodic vacuum arc process. The variation in negative substrate bias from Ϫ20 to Ϫ200 V was found to initially lead to a small decrease in N ͑E F ͒ and E turn-on , and a small increase in the emission current density ͑J͒ at 12.5 V / m in the case of as-grown ta-C films; beyond Ϫ200 V substrate bias there is a reversal in the trend. The values of N ͑E F ͒ = 1.3ϫ 10 17 cm −3 eV −1 , E turn-on = 8.3 V / m, and J = 6.19 mA/ cm 2 were observed at Ϫ200 V substrate bias. However at Ϫ300 V the properties were not very different from those at Ϫ200 V substrate bias and so with a view to use the higher energy, hydrogen and nitrogen incorporation studies were carried out in this condition. It was observed that there was further enhancement in properties with hydrogen and nitrogen incorporation. The best properties measured with in the range of hydrogen and nitrogen incorporation in the present study were N ͑E F ͒ = 8.0ϫ 10 16 cm −3 eV −1 , E turn-on = 7.6 V / m, and J = 23.7 mA/ cm 2 , respectively.

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“…At the exit of voltage of about 10-20 V to the filter with respect to this chamber is connected a magnetic quarter torus the plasma potential). Straight [5] and curved [6] filter (500 mm length, 100 mm inner diameter) made filters have been studied. Presently, the one most of corrugated stainless steel, including an external often employed in practice is the so-called "quarter coil that produces the filtering magnetic field.…”

Section: Methodsmentioning

confidence: 99%

Three-dimensional Ion Distribution in a Filtered Vacuum Arc Discharge

Kelly¹,

Márquez²,

Pirrera³

2006

AIP Conference Proceedings

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Articles you may be interested inExperimentally established correlation between ion charge state distributions and kinetic ion energy distributions in a direct current vacuum arc discharge J. Appl. Phys. 117, 093301 (2015) Abstract. Three-dimensional measurements of the ion flux along the filter of a magnetically filtered d-c vacuum arc are presented. The device includes a metallic plasma-generating chamber with cooper electrodes coupled to a substrate chamber through a quarter-torus magnetic filter. The filtering magnetic field was high enough to magnetize the electrons but not the ions. The ion current distribution was studied using a multi-element Cu probes, placed at three different positions along the filter. The ion saturation current of each probe was measured by biasing the probe at -70V with respect the grounded anode. Preliminary results of the three dimensional ion flux distribution and the floating potential of the plasma as functions of the bias filter voltage and magnetic field intensity are reported.

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Recent progress in filtered vacuum arc deposition

Cited by 155 publications

References 64 publications

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Three-dimensional Ion Distribution in a Filtered Vacuum Arc Discharge

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