Auger electron spectroscopy was used to study the interface of vacuum‐deposited tin oxide on
normalGaAs
substrates. The ratio of oxygen to tin in the tin oxide film, thermally evaporated from
SnO2
powder, was about 1.53. The films are likely a mixture of
normalSnO
and
SnO2
. A transition region approximately 55Å in width exists between the tin oxide and
normalGaAs
substrate, possibly composed of oxides of
normalGaAs
and
normalSnO
, although the formation of a binary compound
false(normalGaSnfalse)
is possible. Heating in air further oxidized the tin oxide to
SnO2
. Heating in air and vacuum resulted in a Ga‐rich surface on the
normalGaAs
substrate. Metal‐insulator‐semiconductor solar cells using vacuum‐evaporated tin oxide interfacial layers showed substantial improvement over cells made without the interfacial layer.