Recent developments in dimensional nanometrology using AFMs

Abstract

Scanning probe microscopes, in particular the atomic force microscope (AFM), have developed into sophisticated instruments that, throughout the world, are no longer used just for imaging, but for quantitative measurements. A role of the national measurement institutes has been to provide traceable metrology for these instruments. This paper presents a brief overview as to how this has been achieved, highlights the future requirements for metrology to support developments in AFM technology and describes work in progress to meet this need.

High-resolution quantitative determination of dielectric function by using scattering scanning near-field optical microscopy

“…For example, in the actual requirements in MOSFETs industry, the optical constant measurement of SiO 2 thin films stands particularly important36. On the other hand, the AFM has become indispensable in the semiconductor industry for dimension metrology46.…”

Scanning Thermal Microscopy (SThM)

“…Calibration grating for AFMs, calibrated using a metrological AFM 4. A user-owned AFM system calibrated using a calibration grating It must be noted that there are not many metrological AFMs: Yacoot and Koenders (2011) listed 27 of them, built since the 1990s around the world. As such systems are not widely available, certification of calibration gratings is time-consuming and relatively expensive, and regular AFM users do not Figure 13 An overview of a commercial AFM equipped with a homemade SThM system, as used in the Nanometrology Group at Wrocław University of Technology.…”

Correlation and convolution filtering and image processing for pitch evaluation of 2D micro- and nano-scale gratings and lattices

“…The above actions have to be iteratively repeated until θ ≈ 0°. Regardless of the size, the raster-scan area is indispensable [13] for metrologically verifying a 2D grating or lattice on a metrological AFM or a NMM, as well as applying it as a standard material to metrologically calibrate an SPM [14], and to map its errors [15,16] in accordance with ISO standards [17]. Except for CG-and FTmethods, there is an absence of literature addressing the problem in 2D pitch evaluation methods.…”