Thin Films and Heterostructures for Oxide Electronics 2005
DOI: 10.1007/0-387-26089-7_13
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Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition

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Cited by 7 publications
(5 citation statements)
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“…As a modification of laser ablation, Henda et al used a pulsed electron deposition (PED) technique, in which energetic electrons are aimed at target material instead of photons. PED uses smaller pulses as compared to laser ablation and provides better electrical efficiency along with an enhanced deposition rate. , The study prepared pyrite thin films onto Pyrex glass substrates from a target material consisting of elemental iron and sulfur. The experiment was carried out at a pressure of around 3.5 mTorr in the presence of argon.…”
Section: Synthesis Of Pyritementioning
confidence: 99%
See 1 more Smart Citation
“…As a modification of laser ablation, Henda et al used a pulsed electron deposition (PED) technique, in which energetic electrons are aimed at target material instead of photons. PED uses smaller pulses as compared to laser ablation and provides better electrical efficiency along with an enhanced deposition rate. , The study prepared pyrite thin films onto Pyrex glass substrates from a target material consisting of elemental iron and sulfur. The experiment was carried out at a pressure of around 3.5 mTorr in the presence of argon.…”
Section: Synthesis Of Pyritementioning
confidence: 99%
“…PED uses smaller pulses as compared to laser ablation and provides better electrical efficiency along with an enhanced deposition rate. 87,88 The study prepared pyrite thin films onto Pyrex glass substrates from a target material consisting of elemental iron and sulfur. The experiment was carried out at a pressure of around 3.5 mTorr in the presence of argon.…”
Section: ■ Synthesis Of Pyritementioning
confidence: 99%
“…The operation principles of the PED process are reported elsewhere [21,27]. At the end of every deposition, the substrate was cooled to room temperature while the chamber was pumped to the base pressure value.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…In techniques such as RF sputtering and CVD, film stoichiometry is critically dependent on parameters such as chamber pressure and substrate temperatures. PLD, however, has several advantages including preservation of target stoichiometry in the film [37]. In addition, films could be deposited under a wide range of chamber pressure and substrate temperatures since the laser source is external to the deposition chamber [37].…”
Section: Introductionmentioning
confidence: 99%
“…PLD, however, has several advantages including preservation of target stoichiometry in the film [37]. In addition, films could be deposited under a wide range of chamber pressure and substrate temperatures since the laser source is external to the deposition chamber [37].…”
Section: Introductionmentioning
confidence: 99%