2021
DOI: 10.1016/j.jnoncrysol.2021.121053
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Rearrangement of the optical properties of a-SiOx: H films after crystallization of silicon nanoclusters

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“…To analyze the obtained spectra, we carried out their decomposition into bands corresponding to amorphous and crystalline phases ( Figure 6 b,d). Raman spectra of both unmodified p-a-Si and n-a-Si films demonstrate bands corresponding to LA, LO, and TO a-Si phases centered at 310, 420, 480 cm −1 , respectively [ 38 , 39 ]. The spectra of irradiated regions indicate formation of a crystalline (nanocrystalline) silicon phase (nc-Si) in the p-a-Si and n-a-Si films as a result of femtosecond laser irradiation, which manifests itself in the presence of a corresponding narrow TO nc-Si line near ω C = 520 cm −1 .…”
Section: Resultsmentioning
confidence: 99%
“…To analyze the obtained spectra, we carried out their decomposition into bands corresponding to amorphous and crystalline phases ( Figure 6 b,d). Raman spectra of both unmodified p-a-Si and n-a-Si films demonstrate bands corresponding to LA, LO, and TO a-Si phases centered at 310, 420, 480 cm −1 , respectively [ 38 , 39 ]. The spectra of irradiated regions indicate formation of a crystalline (nanocrystalline) silicon phase (nc-Si) in the p-a-Si and n-a-Si films as a result of femtosecond laser irradiation, which manifests itself in the presence of a corresponding narrow TO nc-Si line near ω C = 520 cm −1 .…”
Section: Resultsmentioning
confidence: 99%