2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2 2012
DOI: 10.1109/pvsc-vol2.2012.6656762
|View full text |Cite
|
Sign up to set email alerts
|

Rear-surface passivation technology for crystalline silicon solar cells: A versatile process for mass production

Abstract: Over the past few years, significant progress has been made in integrating cell structure improvements on the cell front side into mass production, such as, e.g., selective emitters. With these improvements, the large-area aluminum back-surface field clearly limits the efficiency of typical industrial cells. Dielectric passivation of the cell rear side provides a means for significant improvement. However, it needs to be adapted to different wafer materials and cell structures in order to obtain economic effic… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2012
2012
2020
2020

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(2 citation statements)
references
References 7 publications
0
2
0
Order By: Relevance
“…The front-side emitter is covered with a silicon nitride antireflective coating and the rear surface with a standard dielectric passivation stack, consisting of a thin aluminum oxide layer capped with a silicon nitride layer, both deposited in a plasma-enhanced chemical vapor deposition system. The Line-shaped rear contact openings are formed by laser ablation [15] with a width of 20 1£111 and a pitch of 1 mm. The rear side is metalized with six different AI PERC pastes.…”
Section: Methodsmentioning
confidence: 99%
“…The front-side emitter is covered with a silicon nitride antireflective coating and the rear surface with a standard dielectric passivation stack, consisting of a thin aluminum oxide layer capped with a silicon nitride layer, both deposited in a plasma-enhanced chemical vapor deposition system. The Line-shaped rear contact openings are formed by laser ablation [15] with a width of 20 1£111 and a pitch of 1 mm. The rear side is metalized with six different AI PERC pastes.…”
Section: Methodsmentioning
confidence: 99%
“…On the rear surface, a standard dielectric passivation stack, consisting of a thin aluminum oxide layer capped with a silicon nitride layer, was deposited in a PECVD system. The line-shaped contact openings on the rear side were formed by laser ablation [8]. For simplification of characterization, laser openings were made perpendicular to the front-side fingers.…”
Section: Methodsmentioning
confidence: 99%