2015
DOI: 10.1021/acs.nanolett.5b00411
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Realization of Vertically Aligned, Ultrahigh Aspect Ratio InAsSb Nanowires on Graphite

Abstract: The monolithic integration of InAs(1-x)Sb(x) semiconductor nanowires on graphitic substrates holds enormous promise for cost-effective, high-performance, and flexible devices in optoelectronics and high-speed electronics. However, the growth of InAs(1-x)Sb(x) nanowires with high aspect ratio essential for device applications is extremely challenging due to Sb-induced suppression of axial growth and enhancement in radial growth. We report the realization of high quality, vertically aligned, nontapered and ultra… Show more

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Cited by 37 publications
(31 citation statements)
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“…Although the growth of Sb-based III-V NWs is more difficult than that of other III-V NWs, both 'top-down' and 'bottomup' approaches have been developed for the controllable growth of high-quality thin Sb-based III-V NWs in the past decade [6,42,52,63,[106][107][108][109][110][111]. 'Top-down' approach has been promoted in microelectronic industry.…”
Section: Recent Advances In the Synthesis Of Sb-based Iii-v Nwsmentioning
confidence: 99%
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“…Although the growth of Sb-based III-V NWs is more difficult than that of other III-V NWs, both 'top-down' and 'bottomup' approaches have been developed for the controllable growth of high-quality thin Sb-based III-V NWs in the past decade [6,42,52,63,[106][107][108][109][110][111]. 'Top-down' approach has been promoted in microelectronic industry.…”
Section: Recent Advances In the Synthesis Of Sb-based Iii-v Nwsmentioning
confidence: 99%
“…focus on both the full-composition-range growth of diameter and length controlled GaInSb NWs. [109]. For the monolithic integration with Si, InAsSb NWs have also been successfully grown directly on Si substrates [153].…”
Section: Sb-based Iii-v Ternary Alloy Nwsmentioning
confidence: 99%
“…This is mainly due to the highly dense crystalline defects in the resulting NWs. Different epitaxial techniques have been adopted for high-quality InAsSb NW growth including molecular beam epitaxy (MBE), metal organic chemical vapour deposition (MOCVD) and chemical beam epitaxy (CBE) as well as catalyst-assisted and area selective epitaxy: (i) using MBE, InAsSb NWs were obtained with an Sb content of up to 10% by Zhuang et al on silicon [13,15] and graphite [16], up to 15% by Sourribes et al [17] and 35% grown on GaAs (111) by Potts et al [18]; (ii) using the MOCVD growth technique, catalyst-free InAsSb NWs with an Sb content of up to 43% have also been reported [19], while selective-area epitaxy on patterned InAs substrates recently demonstrated InAsSb NWs with an Sb content of 15% [14]; (iii) using MOCVD with Au-catalysis, InAsSb NWs with an Sb content of up to 77% have been obtained [20,21]; and (iv), using Au-catalyzed CBE, InAsSb NWs with a whole range of Sb have been realized [22]. Although there has been significant progress in increasing Sb incorporation, there has been no success in extending the emission wavelength above 4.0 μm.…”
Section: Some Figures May Appear In Colour Only In the Online Journal)mentioning
confidence: 99%
“…The large and dense arrays of nanowires (NWs) vertically-aligned on a substrate are benecial for a wide range of applications, such as eld-emission displays, surface-enhanced Raman scattering (SERS), energy harvesting, optoelectronics, multiferroic systems, biosensors and nanomedicine, only to mention a few. [1][2][3][4][5][6][7][8]56 Besides, the tubular geometrical shape of the synthesized nanostructures may expand the range of multifunctional applications, as demonstrated using vertically-aligned forests of carbon nanotubes (NTs) and inorganic NTs. [9][10][11][12][13] In this regard, the arrays of homogeneous and heterostructured magnetic NTs have recently attracted a lot of interest, since they are promising for potential applications, such as magnetic bio-devices, anodes for lithium ion batteries and storage devices.…”
Section: Introductionmentioning
confidence: 99%