Realization of a helix-based perfect absorber for IR spectral range using the direct laser write technique

CMOS-compatible mid-IR metamaterial absorbers for out-of-band suppression in optical MEMS

“…10. The typical unit-cell and center wavelength for the state of the art mid-infrared metamaterial absorbers, fabricated using e-beam [22][23][24][25][29][30][31][32][33][34][35][36][37], standard UV [39][40][41][42][43], Deep UV (DUV) [21], and direct laser writing (DLW) [38] lithography methods. The metamaterial structure presented in this paper is also shown for comparison.…”

“…A mid-infrared metamaterial design requires a sub-micron pattern resolution. Conventionally, high-resolution lithography methods, such as e-beam [22][23][24][25][29][30][31][32][33][34][35][36][37], deep UV (DUV) [21], or direct laser write [38] lithography are used. However, the low throughput of e-beam lithography makes fabrication of relatively large-area devices time consuming, while DUV is prohibitively expensive.…”

UV to NIR optical properties of IP-Dip, IP-L, and IP-S after two-photon polymerization determined by spectroscopic ellipsometry

“…Here the focus is on three commonly used, 3D-DLW-compatible polymers, which are commercially available as IP-Dip, IP-L, and IP-S (Nanoscribe, GmbH). The difference in viscosity between IP-Dip, IP-L, and IP-S allows the fabrication of structures with a wide range of critical dimensions in the nm to the µm range [13,25,26]. For each polymer, two samples in the shape of rectangular cuboids with a 100 µm × 100 µm base and two different heights were fabricated on Si substrates using a commercially available 3D-DLW system (Photonic Professional GT, Nanoscribe, GmbH).…”

Tailoring Metal and Insulator Contributions in Plasmonic Perfect Absorber Metasurfaces

“…[1][2][3][4][5][6][7] The photo-thermal generation of heat at the plasmon resonance is applied for photo-thermal therapy, is also used for thermal emitters, photothermal energy conversion, and photovoltaic applications. [8][9][10][11][12][13][14][15][16][17] Chiral optical metamaterials 18 introduce selectivity to enantiomers strongly required in bio-medical fingerprinting by SERS and SEIRA. With increasing demand of tailored plasmonic properties, various material are required including alloys, semiconductors, and graphene [19][20][21][22][23][24][25][26][27] with increasing versatility of engineered properties.…”