Realistic Silver Optical Constants for Plasmonics

Jiang, Yajie; Pillai, Supriya; Green, Martin A.

doi:10.1038/srep30605

Cited by 101 publications

(77 citation statements)

References 21 publications

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“…Optical constants of Si, ITO, and Ag in the SHJ cells were taken from the literature. [24][25][26] Abs(λ) of an ideal Lambertian light-trapping limit was also analytically calculated by the formula reported by Green et al 27…”

Section: Optical Modelingmentioning

confidence: 95%

“…We assumed the simple calculation model that has the same structure as shown in Figure , with ideal up‐right random pyramids with a top angle of 54.7° and a width of 5 μm on the front and the rear surfaces. Optical constants of Si, ITO, and Ag in the SHJ cells were taken from the literature . Abs(λ) of an ideal Lambertian light‐trapping limit was also analytically calculated by the formula reported by Green et al…”

Section: Simulationmentioning

confidence: 99%

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Potential of very thin and high‐efficiency silicon heterojunction solar cells

Sai

Oku

Satô

et al. 2019

Progress in Photovoltaics

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Thin crystalline silicon (c‐Si) solar cells are highly attractive for realizing light‐weight and flexible wafer‐based solar cells as well as for reducing the material cost. Silicon heterojunction (SHJ) architecture using hydrogenated amorphous silicon (a‐Si:H) is suitable for realizing very thin c‐Si cells, because of its capability of excellent surface passivation. In this work, the potential of very thin c‐Si solar cells is examined by characterizing SHJ solar cells with a wide range of thicknesses from 50 to 400 μm. A trade‐off between the open‐circuit voltage (VOC) and the short circuit current density (JSC) against wafer thickness is clearly observed in these SHJ cells, whereas a decrease in fill factor (FF) is found for thin SHJ cells below 80 μm. The loss analysis for the thin SHJ cells with numerical simulation clarifies that the infrared parasitic absorption loss due to the supporting layers is enhanced for thinner wafers, which limits the JSC in the thin SHJ cells. In addition, it is confirmed that the FF is more sensitive to surface recombination than the VOC, and this tendency becomes more pronounced with the decrease in the wafer thickness. A high efficiency of 22% is achieved in a SHJ solar cell with a thickness of only 46 μm, demonstrating a high potential for flexible high‐efficiency c‐Si solar cells.

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Section: Optical Modelingmentioning

confidence: 95%

Section: Simulationmentioning

confidence: 99%

Potential of very thin and high‐efficiency silicon heterojunction solar cells

Sai

Oku

Satô

et al. 2019

Progress in Photovoltaics

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“…lattice architecture has been extensively studied as ultralight mechanical metamaterials. [8,18] We also fabricated the lattice to make structure electronics. Figure 4e depicts the visual images of the designed lattice by SolidWorks.…”

Section: The Application Of Printed Ipn Epoxy Composites In Structuramentioning

confidence: 99%

High‐Speed 3D Printing of High‐Performance Thermosetting Polymers via Two‐Stage Curing

Xiao

Zhao

Chen

et al. 2018

Macromol. Rapid Commun.

167

116

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Design and direct fabrication of high-performance thermosets and composites via 3D printing are highly desirable in engineering applications. Most 3D printed thermosetting polymers to date suffer from poor mechanical properties and low printing speed. Here, a novel ink for high-speed 3D printing of high-performance epoxy thermosets via a two-stage curing approach is presented. The ink containing photocurable resin and thermally curable epoxy resin is used for the digital light processing (DLP) 3D printing. After printing, the part is thermally cured at elevated temperature to yield an interpenetrating polymer network epoxy composite, whose mechanical properties are comparable to engineering epoxy. The printing speed is accelerated by the continuous liquid interface production assisted DLP 3D printing method, achieving a printing speed as high as 216 mm h . It is also demonstrated that 3D printing structural electronics can be achieved by combining the 3D printed epoxy composites with infilled silver ink in the hollow channels. The new 3D printing method via two-stage curing combines the attributes of outstanding printing speed, high resolution, low volume shrinkage, and excellent mechanical properties, and provides a new avenue to fabricate 3D thermosetting composites with excellent mechanical properties and high efficiency toward high-performance and functional applications.

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“…Au has an absorption maximum of 94.85% for d = 10 nm. [37,38] Thus, as a consequence, the permittivity's imaginary part presents a higher value than the pure metals (see Figure S2 in the Supporting Information). For Cr, the absorption peak of the superabsorber slightly increases in the NIR, reaching its maximum value (94.56%) at d = 75 nm.…”

mentioning

confidence: 99%

“…[36] In addition, it is likely that the small grains composing the film and their boundaries lead to increased absorption. [37,38] Thus, as a consequence, the permittivity's imaginary part presents a higher value than the pure metals (see Figure S2 in the Supporting Information). Figure 1g-l presents the normal incidence absorption maps as a function of d, where four distinct modes (m i , i = 1 to 4) are identified.…”

mentioning

confidence: 99%

Lithography‐Free, Omnidirectional, CMOS‐Compatible AlCu Alloys for Thin‐Film Superabsorbers

Dias

Gong

Benson

et al. 2017

Advanced Optical Materials

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single, multiple, or broadband frequency of the electromagnetic spectrum. The ultrahigh light absorption is obtained due to an impedance match between the material and the medium. [9] Here, the electric and magnetic resonances are designed so that the bulk effective impedance is equal to the one of the free space (air or vacuum). As a result, most of the incident light is absorbed and the reflection is negligible. Salisbury [10] and Dallenbach [11] first idealized classical absorbers to operate in the microwave range of the electromagnetic spectrum. The former included a resistive layer located at a quarter wavelength from a metallic substrate while the latter consisted of a dielectric layer on top of a metallic substrate.In the past two decades, advances in nanofabrication have given rise to nanostructures with controlled geometry, recently inspiring the design of metamaterials and metasurfaces for superabsorbers. [12] With the flexibility of tuning nanostructures' geometry and periodicity, such absorbers have been demonstrated in the visible, [13,14] near-infrared (NIR), [15] mid-infrared (MIR), [16] and far-infrared (FIR) [17,18] frequency ranges, proving to be a powerful approach for producing optical responses that are not feasible by any conventional material. However, the cost of the current fabrication methods limits their commercial applications. For instance, metasurfaces consisting of arrays of nanostructures on a dielectric surface are difficult to manufacture through physical deposition approaches in large scale even by using state-of-the-art bottomup nanolithography methods.To overcome the scalability constraints of the fabrication methods currently implemented for metasurfaces, the use of thin films in superabsorbers has been explored for a broad range of the spectrum, extending from visible to the FIR. [19][20][21][22][23][24][25][26][27][28] The Dallenbach configuration provides significant benefits regarding the fabrication of ultrathin, planar, omnidirectional, and polarization independent structures with very high absorption. Recently, it was reported that more than 98% of the normally incident light could be absorbed in an ultrathin layer of Ge on top of Ag at a wavelength (λ) of 625 nm, decreasing to 80% for incident angles up to 66° for both polarizations. [21] In addition, highly doped Si has been used as a metallic-like substrate under a thin Ge layer to absorb light in the MIR, where the doping concentration in Si was the knob to engineer its Superabsorbers based on metasurfaces have recently enabled the control of light at the nanoscale in unprecedented ways. Nevertheless, the sub-wavelength features needed to modify the absorption band usually require complex fabrication methods, such as electron-beam lithography. To overcome the scalability limitations associated with the fabrication of metallic nanostructures, engineering the optical response of superabsorbers by metal alloying is proposed, instead of tuning the geometry/size of the nanoscale building blocks. The superior performance...

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Realistic Silver Optical Constants for Plasmonics

Cited by 101 publications

References 21 publications

Potential of very thin and high‐efficiency silicon heterojunction solar cells

Potential of very thin and high‐efficiency silicon heterojunction solar cells

High‐Speed 3D Printing of High‐Performance Thermosetting Polymers via Two‐Stage Curing

Lithography‐Free, Omnidirectional, CMOS‐Compatible AlCu Alloys for Thin‐Film Superabsorbers

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