Real-time estimation and control of CD uniformity in lithography

Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing

“…Microelectronics and high-density data storage media require patterned templates with a high resolution and well-controlled widths of the critical features, which are defined in terms of the critical dimensions (CD). [1][2][3][4][5][6][7][8][9][10][11][12] High resolution and well-controlled CD, however, are two competing attributes of patterned templates and improvements in one often come at the sacrifice of the other. Herein we describe a method for narrowing the block copolymer domain width distribution and achieving block copolymer patterns with both high resolution and wellcontrolled CD.…”