Dynamic management of controls in semiconductor manufacturing

A Literature Review on Sampling Techniques in Semiconductor Manufacturing

“…Song-Bor et al [44], Sullivan et al [45], Mouli et al [48], and Nduhura Munga et al [55] present industrial deployments of adaptive sampling plans in four different semiconductor companies: TSMC, IBM Microelectronics, Intel Corporation, and STMicroelectronics respectively.…”

“…A Sample Planner is developed by KLATencor to assist in the development of cost-effective defect inspection sampling strategies, and to provide an accurate assessment of whether monitor reduction and/or elimination should be pursued for cost savings. The results of the project indicate that the costs due to defect excursions could com- [33] 1995 * * Kuo et al [34] 1996 * * * Kuo et al [12] 1997 * * Babikian and Engelhard [35] 1998 * Williams et al [36] 1999 * * Williams et al [37] 1999 * * Langford et al [38] 2000 * * Nurani and Shantikumar [39] 2000 * * * Lee et al [40] 2001 * * Wootton et al [41] 2001 * * Allebé et al [42] 2002 * * Lee [43] 2002 * * Song-Bor et al [44] 2003 * * Sullivan et al [45] 2004 * * Moon et al [46] 2005 * * Boussetta and Cross [14] 2005 * * Mouli [13] 2005 * Shantikumar [47] 2007 * Mouli et al [48] 2007 * * Bunday et al [49] 2008 * Veetil et al [50] 2009 * * Chen et al [51] 2009 * * Sahnoun et al [52] 2010 * * Sahnoun et al [53] 2010 * * * Good et al [54] 2010 * * Nduhura Munga et al [55] 2011 * * pletely eradicate any projected savings from monitor reduction activities, due to the additional defect excursions that would be missed by the reduced inspection sampling plan. Wootton et al [41] present a study performed between KLA-Tencor and Motorola.…”

“…Results indicate a reduction of 30% of excursions without increasing tool capacity or sampling rates. Nduhura Munga et al [55] present an adaptive sampling strategy based on the real time computation of the material at risk. In order to optimize the computational time, a Permanent Index per Context (IPC) is developed to reduce risk computation by simple subtractions or additions.…”

Preliminary study of an intelligent sampling decision scheme for the AVM system

“…[4] pointed out it is necessary to increase sampling when encountering manufacturing disturbances that include external disruptions (e.g., tool maintenance, tool repair, or recipe adjustment) and internal disruptions (such as disruptions detected by sensor signals or metrology). Lee [5] and Munga et al [6] brought up the concept of dynamic sampling to utilize a more effective inspection and to increase the throughput of inspection tools without affecting the production quality which may achieve the goal of cycle time reduction. Furthermore, a study by Nduhura-Munga et al [7] generalized sampling methods into three categories: static, adaptive, and dynamic samplings.…”

A dynamic sampling methodology for plasma etch processes using Gaussian process regression

“…Adaptive sampling, achieved by adjusting static sampling schemes set at the start of production according to the process state, adds flexibility by enabling more or less sampling to take place as appropriate to the conditions [4], [5], [6]. Recent developments in sampling methodologies have focused on dynamic sampling strategies which seek to bring as much information as possible on both risk reduction and process variation [2].…”