2005
DOI: 10.1039/b413060j
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Reactivity of tetrakisdimethylamido-titanium(iv) and -zirconium(iv) with thiols

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Cited by 9 publications
(9 citation statements)
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References 33 publications
(64 reference statements)
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“…In this respect, it is interesting to note that titanium sulfide films produced by CVD processes with substrate temperatures below 800°C are usually found to be amorphous. [3,[6][7][8] In addition, we found that the positions of the broad peaks (marked by an asterix) are similar to those reported for some LiTiO 2 phases. [45,46] However, this would require reduction of Ti 4+ to Ti 3+ and the presence of distinct amounts of moisture and the presence of oxygen should also lead to the formation of PhSSPh which was not found in the cleavage products.…”
Section: Thermal Behaviorsupporting
confidence: 77%
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“…In this respect, it is interesting to note that titanium sulfide films produced by CVD processes with substrate temperatures below 800°C are usually found to be amorphous. [3,[6][7][8] In addition, we found that the positions of the broad peaks (marked by an asterix) are similar to those reported for some LiTiO 2 phases. [45,46] However, this would require reduction of Ti 4+ to Ti 3+ and the presence of distinct amounts of moisture and the presence of oxygen should also lead to the formation of PhSSPh which was not found in the cleavage products.…”
Section: Thermal Behaviorsupporting
confidence: 77%
“…[3] Thiol adducts of the type [TiC1 4 (HSR) 2 ] (R = c-C 6 H 11 or c-C 5 H 9 ) were found to afford bronze colored films of polycrystalline TiS 2 in CVD experiments (200-600°C, at 0.1 Torr). [4,5] [8] which led to the formation of films of TiS 2 . Thermal decomposition experiments on heteronuclear copper titanium thiolato complexes have not been reported so far.…”
Section: Thermal Behaviormentioning
confidence: 98%
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