Reactive magnetron sputtering of Nb-doped TiO2 films: Relationships between structure, composition and electrical properties

Effect of micromorphology on transport properties of Nb‐doped anatase TiO2 films: A transmission electron microscopy study

“…It should be stressed that the Lo-p w film exhibited a rather homogeneous micromorphology and an even higher m H of 9.2 cm 2 V À1 s À1 than those of the PLD films. The obtained r value (5.8 Â 10 À4 Vcm) for the Lo-p w film is one of the best among the literature values for the TNO films prepared by RF, DC, and pulsed-DC sputtering [7][8][9][10][11][12][13][14][15][16][17][18][19], and is approximately half of those reported for the TNO films by chemical vapor deposition [33] and atomic layer deposition [31,34], $1 Â 10 À3 Vcm. These results indicate that careful selection of p w is of particular importance to obtain high quality sputtered TNO films suitable for transparent electrodes.…”

“…Nb‐doped anatase TiO 2 (TNO) is a newly developed TCO with unique properties, such as excellent chemical stability , high refractive index , and wide conductivity range . Since the discovery of TNO grown by pulsed laser deposition (PLD) , many efforts have been dedicated to fabricate highly conductive TNO on glass substrates with a scalable and industrial deposition method, that is, sputtering . In our previous studies using PLD and sputtering , we observed that TNO films crystallized from amorphous precursors that were deposited on unheated substrates, exhibited high conductivity.…”

“…Nb-doped anatase TiO 2 (TNO) [2,3] is a newly developed TCO with unique properties, such as excellent chemical stability [4], high refractive index [5], and wide conductivity range [6]. Since the discovery of TNO grown by pulsed laser deposition (PLD) [2], many efforts have been dedicated to fabricate highly conductive TNO on glass substrates with a scalable and industrial deposition method, that is, sputtering [7][8][9][10][11][12][13][14][15][16][17][18][19].…”

Electrical Properties of Nb-Doped TiO2 Thin Films Deposited by Co-sputtering Process

“…This provides further motivation to new TCOs for less environmental impact, lower cost, efficiency improvements in important devices. Recently, Nb-doped anatase TiO 2 (Ti 1-x Nb x O 2 ; NTO) thin films in both epitaxial and polycrystalline forms were found to exhibit low ρ of the order of 10 -4 Ωcm and high transmittance of 60 ~ 90 % in the visible region [5][6][7][8][9]. TiO 2 has properties that other conventional host materials of TCOs do not possess, such as a high refractive index [10], high transmittance in the infrared region, large static permittivity [11] and high chemical stability especially in a reducing atmosphere [12].These lead us to expect that TNO shave sufficient potential as a next-generation TCOs.…”

Anomalous Current–Voltage Behavior in Al/TiO2/n‐Si Structures

“…The difference from a regular capacitor, besides the very high leakage current, is that the negative charge is not accumulated in one of the capacitor plates but instead is distributed throughout the titania. The study of these conduction aspects in TiO 2 is now becoming important given its active role in semiconductor devices such as solar cells (including dye‐sensitized and perovskite), resistive memories, MIS capacitors employing high‐ κ dielectrics and even transparent conducting oxides, to list a few. Recently the TiO 2 /Si heterojunction was used as a solar cell, taking advantage of the hole blocking capabilities of TiO 2 .…”