2011
DOI: 10.1116/1.3528248
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Reactive ion etching of tellurite and chalcogenide waveguides using hydrogen, methane, and argon

Abstract: The authors report in detail on the reactive plasma etching properties of tellurium and demonstrate a high quality etching process using hydrogen, methane, and argon. Very low loss planar ridge waveguides are demonstrated. Optical losses in tellurium dioxide waveguides below 0.1 dB/cm in most of the near infrared region of the electromagnetic spectrum and at 1550 nm have been achieved-the lowest ever reported by more than an order of magnitude and clearly suitable for planar integrated devices. The etch proces… Show more

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Cited by 12 publications
(8 citation statements)
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“…Indeed waveguide amplifiers and lasers, fabricated by ultrafast laser inscription, provide in many cases a performance comparable to that exhibited by devices fabricated by ion exchange or plasma-enhanced chemical vapor deposition [10]. Active device fabrication by femtosecond laser inscription has been particularly interesting for materials that are unmanageable to be processed by other fabrication techniques, eg: Tellurites, Tellurides, Chalcogenides etc [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…Indeed waveguide amplifiers and lasers, fabricated by ultrafast laser inscription, provide in many cases a performance comparable to that exhibited by devices fabricated by ion exchange or plasma-enhanced chemical vapor deposition [10]. Active device fabrication by femtosecond laser inscription has been particularly interesting for materials that are unmanageable to be processed by other fabrication techniques, eg: Tellurites, Tellurides, Chalcogenides etc [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…One of the major reasons for the delay in attaining integrated versions of the high quality fiber based tellurite devices has been the difficulties in fabricating low loss waveguides in an integrated platform. Tellurite EDWAs have been realized in the last few years by femtosecond laser inscription [14,15] and the discovery of reactive ion etching processes using argon, hydrogen and methane [16][17][18]. Using these methods tellurite EDWAs have been successfully fabricated in bulk glass plates [14,15] and by reactive RF sputtering of thin films followed by plasma etching [16].…”
Section: Introductionmentioning
confidence: 99%
“…Figure a clearly shows that very smoothed etched surfaces have been attained with a newly developed Ar‐/H 2 ‐/CH 4 ‐based process, this being the critical step in attaining such low waveguide losses.…”
Section: Waveguide Fabrication Methods and State Of The Artmentioning
confidence: 99%
“…Figure 2a shows a cross-section of a waveguide after etching, and Figure 2b shows the propagation loss spectrum out to 1700 nm. Figure 2a clearly shows that very smoothed etched surfaces have been attained with a newly developed Ar-/H 2 -/CH 4 -based process, 68 this being the critical step in attaining such low waveguide losses.…”
Section: Waveguide Fabrication Methods and State Of The Artmentioning
confidence: 99%