2007
DOI: 10.1117/12.758011
|View full text |Cite
|
Sign up to set email alerts
|

Reactive ion beam etching of multilayer diffraction gratings with SiO 2 as the top layer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 9 publications
0
2
0
Order By: Relevance
“…Current state-of-the-art methods 19 can produce gratings of area 1 m2 via reactive ion etching (RIE) techniques. However, these methods are currently incapable of producing larger gratings.…”
Section: Discussion: Reaping the Benefits Of Pog Designsmentioning
confidence: 99%
“…Current state-of-the-art methods 19 can produce gratings of area 1 m2 via reactive ion etching (RIE) techniques. However, these methods are currently incapable of producing larger gratings.…”
Section: Discussion: Reaping the Benefits Of Pog Designsmentioning
confidence: 99%
“…24. 173,174 Recently, the investigations for the effect of electric field on LIDT were attractive. These works focused on optimization of the electric field distributions in the grating ridges and the damage process, the LIDT can be improved.…”
Section: Multilayer Dielectric Gratingsmentioning
confidence: 99%