Reactive evaporation of low-defect density hafnia

Abstract

Motivation for this work includes observations at Lawrence Livermore National Laboratory of a correlation between laser damage thresholds and both the absorption and the nodular-defect density of coatings. Activated oxygen is used to increase the metal-oxidation kinetics at the coated surface during electron-beam deposition. A series of hafnia layers are made with various conditions: two µ-wave configuations, two sources (hafnium and hafnia), and two reactive oxygen pressures. Laser damage thresholds (1064-nm, 10-ns pulses), absorption (at 511 nm), and nodular-defect densities from these coatings are reported. The damage thresholds are observed to increase as the absorption of the coatings decreases. However, no significant increase in damage thresholds are observed with the coatings made from a low nodular-defect density source material (hafnium). Hafnia coatings can be made from hafnium sources that have lower nodular-defect densities, lower absorption, and damage thresholds thatare comparable with coatings made from a conventional hafnia source.

Fast, microwave-assisted synthesis of monodisperse HfO2 nanoparticles

“…HfO2 thin layers are highly promising as high-κ dielectric layers in CMOS technology and as dielectric capacitor layers in DRAMs (Wilk et al 2001). Hafnium oxide layers are also used as heat-resistant and highly reflective, protective optical coatings (Chow et al 1993;Waldorf et al 1993), as sensors (Gruger et al 2005;Al-Kuhaili et al 2004) and as photoluminescent materials (Eliziario et al 2009). In recent years, increasing research activities have been dedicated to the synthesis of metal oxide nanoparticles (Park et al 2007;Baghbanzadeh et al 2011).…”

Influence of oxygen plasma treatment on properties of ZrO2 films prepared by e-beam evaporation techniques

“…Generally, this suboxide component has higher absorption compared with the oxides [8]. Because of the high oxidation of oxygen plasma, the ion treatment will repair the oxygen vacancies and modify the substoichiometry defects to some degree [9]. So the absorption and extinction coefficient were reduced correspondingly, as shown in Fig.…”

Laser damage of silica and hafnia thin films made with different deposition technologies

“…[4][5][6][7][8] But these last techniques have better optical, mechanical and environmental properties. The improvement of the laser damage resistance of dense layers has therefore a considerable interest for the community.…”