2017
DOI: 10.1016/j.jallcom.2017.03.050
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Reactive co-sputtering of hematite doped silica (Fe2O3-SiO2) thin films

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Cited by 6 publications
(2 citation statements)
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References 55 publications
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“…31 Further, the N peak was located at 398 eV, which is consistent with Si-N. 31 The O peak for the SiN samples is located at 532.2 eV, which is consistent with SiO 2 . 41 The O peak for the SiFeCN coatings is wider and likely have several contributions, including Fe-O (530.5 eV (ref. 41)).…”
Section: Papermentioning
confidence: 99%
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“…31 Further, the N peak was located at 398 eV, which is consistent with Si-N. 31 The O peak for the SiN samples is located at 532.2 eV, which is consistent with SiO 2 . 41 The O peak for the SiFeCN coatings is wider and likely have several contributions, including Fe-O (530.5 eV (ref. 41)).…”
Section: Papermentioning
confidence: 99%
“…41 The O peak for the SiFeCN coatings is wider and likely have several contributions, including Fe-O (530.5 eV (ref. 41)). Following dissolution in cell media the survey spectra for the exposed coatings exhibited a Ca contribution (Fig.…”
Section: Papermentioning
confidence: 99%