Rapid Thermal Dopants Diffusion and Surface Passivation for Silicon Solar Cells Applications

Abstract

Limiting thermal exposure time using Rapid Thermal Processing (RTP) is now emerging as a promising simplified process for manufacturing of terrestrial solar cells in a continuous way. In this work, we present results on simultaneous formation of emitter, back-surface field and surface passivation in a single rapid thermal cycle. Spin-on dopants (SOD) solutions are used as dopant sources. Optimal emitter profiles, low sheet resistances and high gettering effect are reached. The residual SOD film is used as a surface passivation layer. Solar cells with efficiencies in the range 10 -14 % are obtained depending on temperature and time processing.