2008
DOI: 10.1016/j.apsusc.2008.05.118
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Rapid thermal annealing induced changes on the contact of Ni/Au to N-doped ZnO

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Cited by 7 publications
(1 citation statement)
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“…The photobleaching of the as-prepared film due to annealing is assigned to an increase of hetero-polar bond density. Shan et al [138] have observed thermal annealing induced changes in N-doped ZnO thin films. They have observed ohmic behavior after thermally annealing the Ni/Au metal contacts in nitrogen environment and change in nature of charge carriers from p-type to n-type after annealing at 550 °C which has been attributed to the instability nature of the p-type N-doped ZnO or the dissociation of ZnO caused by annealing process in N 2 ambient.…”
Section: Structuralmentioning
confidence: 99%
“…The photobleaching of the as-prepared film due to annealing is assigned to an increase of hetero-polar bond density. Shan et al [138] have observed thermal annealing induced changes in N-doped ZnO thin films. They have observed ohmic behavior after thermally annealing the Ni/Au metal contacts in nitrogen environment and change in nature of charge carriers from p-type to n-type after annealing at 550 °C which has been attributed to the instability nature of the p-type N-doped ZnO or the dissociation of ZnO caused by annealing process in N 2 ambient.…”
Section: Structuralmentioning
confidence: 99%