1990
DOI: 10.1117/12.22788
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Rapid, noncontact optical figuring of aspheric surfaces with plasma-assisted chemical etching

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Cited by 19 publications
(8 citation statements)
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“…So, if machining accuracy or surface roughness of the requirement cannot be obtained using the PCVM machine, the finishing process will be carried out by the NC-EEM machine shown in Fig. 5 against other techniques [10][11][12][13][14][15][16][17][18][19][20][21] are shown in Fig. 10.…”
Section: Article In Pressmentioning
confidence: 99%
“…So, if machining accuracy or surface roughness of the requirement cannot be obtained using the PCVM machine, the finishing process will be carried out by the NC-EEM machine shown in Fig. 5 against other techniques [10][11][12][13][14][15][16][17][18][19][20][21] are shown in Fig. 10.…”
Section: Article In Pressmentioning
confidence: 99%
“…They verified the basic principle of plasma processing for the first time to form a flat optical surface using PACE, proposed the advantages of plasma in optical processing, such as no mechanical pressure, no mechanical deformation in processing brittle materials, precise material removal rate, no edge effect, no sub-surface damage, and no surface pollution, etc. Bollinger discussed the pre-processing methods and suitable removal depth strategies for fused silica necessary to ensure that final PACE-finished surfaces meet low-scatter optical standards [2]. Hoskins of Hughes Danbury Optical Systems (HDOS) researched the processing of aspheric optical mirrors using PACE [3], greatly reduced the time and cost of figuring large optics by its rapid convergence to the final figure requiring, only two to three measurement/figuring cycles to reach 1/50 wave surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…Several high-precision removal methods based on chemical reactions that use plasma have been proposed [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. One such method is plasma chemical vaporization machining (CVM) proposed by Mori et al [11], which uses an rf plasma generated close to an electrode in an atmospheric-pressure environment.…”
Section: Introductionmentioning
confidence: 99%