2014
DOI: 10.1364/ao.53.001802
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Rapid fabrication of on-demand high-resolution optical masks with a CD–DVD pickup unit

Abstract: A low-cost, direct fabrication technique with a micrometer range resolution has been implemented for rapid prototyping of optical masks for photolithography and structured light and diffraction optics applications. Using a setup based on the optical unit of a compact disc-digital versatile disc burner, a low-energy infrared laser beam was focused on a thin polymeric layer with embedded absorbing carbon nanopowder coated on a transparent glass substrate. This allowed for the generation of a custom-made transpar… Show more

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Cited by 8 publications
(2 citation statements)
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References 11 publications
(13 reference statements)
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“…However, they have high-cost fabrication [14]. Several authors have conducted studies where inexpensive photomasks are used in order to reduce the overall costs of the photomasks fabrication (including facilities) and, consequently, of the photolithographic processes [15,16]. Despite portraying the need for low-cost technologies these approaches use specific equipment and relatively complex processes.…”
Section: Uv Exposurementioning
confidence: 99%
“…However, they have high-cost fabrication [14]. Several authors have conducted studies where inexpensive photomasks are used in order to reduce the overall costs of the photomasks fabrication (including facilities) and, consequently, of the photolithographic processes [15,16]. Despite portraying the need for low-cost technologies these approaches use specific equipment and relatively complex processes.…”
Section: Uv Exposurementioning
confidence: 99%
“…It is interesting to remark that the depth of the ablated patterns is typically lower than what is obtained with direct PDMS/CNP coatings, reaching a maximum of 10 µm in the best case, as observed with a KLA-Tencor D600 profilometer. In addition, the optically absorbing layer is fully removed after etching, offering a great optical contrast between transparent and opaque areas for the development of optical masks, improving our previously reported results [41]. However, one disadvantage of this technique compared to that presented in [12] is that it is impossible to wash the residual CNP after the etching process; this limits its use for samples that do not require optical transparency around laser-etched micropatterns.…”
Section: Resultsmentioning
confidence: 91%