Rapid fabrication of bilayer graphene devices using direct laser writing photolithography

Leon, J.; Alves, Endrigo Gabellini Leonel; Elias, D. C.; Brant, J. C.; Barbosa, Tiago Campolina; Malard, Leandro M.; Pimenta, M. A.; Plentz, F.

doi:10.1116/1.3556978

Cited by 14 publications

(6 citation statements)

References 24 publications

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“…Chemical vapor deposition (CVD) graphene devices were used for the electrical characterization of the effect of thionine on the electric transport properties of graphene. The CVD graphene devices were produced by direct laser writing photolithography, as previously developed by our group . We made use of commercial CVD monolayer graphene samples grown on copper foils (purchased from Graphene Platform) and transferred them to a 300 nm thick SiO 2 layer, over a highly p-doped Si substrate, using the conventional poly(methyl methacrylate) transfer technique .…”

Section: Methodsmentioning

confidence: 99%

“…The CVD graphene devices were produced by direct laser writing photolithography, as previously developed by our group. 29 We made use of commercial CVD monolayer graphene samples grown on copper foils (purchased from Graphene Platform) and transferred them to a 300 nm thick SiO 2 layer, over a highly p-doped Si substrate, using the conventional poly(methyl methacrylate) transfer technique. 30 The electric contact was fabricated by thermal evaporation of 5 nm of Cr, followed by 100 nm of Au.…”

Section: ■ Experimental Sectionmentioning

confidence: 99%

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Thionine Self-Assembled Structures on Graphene: Formation, Organization, and Doping

et al. 2018

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The association of organic molecules with two-dimensional (2D) materials, creating hybrid systems with mutual influences, constitutes an important testbed for both basic science self-assembly studies and perspective applications. Following this concept, in this work, we show a rich phenomenology that is involved in the interaction of thionine with graphene, leading to a hybrid material formed by well-organized self-assembled structures atop graphene. This composite system is investigated by atomic force microscopy, electric transport measurements, Raman spectroscopy, and first principles calculations, which show (1) an interesting time evolution of thionine self-assembled structures atop graphene; (2) a highly oriented final molecular assembly (in accordance with the underlying graphene surface symmetry); and (3) a strong n-type doping effect introduced in graphene by thionine. The nature of the thionine-substrate interaction is further analyzed in experiments using mica as a polar substrate. The present results may help pave the way to achieve tailored 2D material hybrid devices via properly chosen molecular self-assembly processes.

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Section: Methodsmentioning

confidence: 99%

Section: ■ Experimental Sectionmentioning

confidence: 99%

Thionine Self-Assembled Structures on Graphene: Formation, Organization, and Doping

et al. 2018

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“…As micro/nano structural components with continuous surfaces, fabrication technologies for microlens arrays include laser direct writing [4][5][6], multi-layer etching [7,8], grayscale lithography [9][10][11], 3D printing technology [12][13][14], and mask-moving technologies [15]. Direct writing technology offers a high precision and resolution but is costly and less efficient, so it is unsuitable for mass fabrication or fabrication of large-sized micro-optical elements.…”

Section: Introductionmentioning

confidence: 99%

Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

Gong,

Zhou,

Liu

et al. 2024

Micromachines

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Microlens arrays, as typical micro-optical elements, effectively enhance the integration and performance of optical systems. The surface shape errors and surface roughness of microlens arrays are the main indicators of their optical characteristics and determine their optical performance. In this study, a mask-moving-projection-lithography-based high-precision surface fabrication method for microlens arrays is proposed, which effectively reduces the surface shape errors and surface roughness of microlens arrays. The pre-exposure technology is used to reduce the development threshold of the photoresist, thus eliminating the impact of the exposure threshold on the surface shape of the microlens. After development, the inverted air bath reflux method is used to bring the microlens array surface to a molten state, effectively eliminating surface protrusions. Experimental results show that the microlens arrays fabricated using this method had a root mean square error of less than 2.8%, and their surface roughness could reach the nanometer level, which effectively improves the fabrication precision for microlens arrays.

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“…Maskless lithography techniques include directwrite lithography and digital maskless lithography techniques. Direct-write lithography techniques comprise electron beam direct-write lithography [6][7][8], ion beam direct-write lithography [9,10], and two-photon laser direct-write lithography [11][12][13][14][15]. However, these Photonics 2023, 10, 1135 2 of 13 methods suffer from low production efficiency and high processing costs, making them unsuitable for large-scale or large-sized micro-optical component fabrication.…”

Section: Introductionmentioning

confidence: 99%

Mask-Shifting-Based Projection Lithography for Microlens Array Fabrication

Gong,

Zhou,

Sun

et al. 2023

Photonics

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Microlens arrays play a critical role in enhancing imaging systems due to their outstanding optical performance, compact size, and lightweight nature. However, traditional fabrication methods for microlens arrays suffer from low precision, inefficiency, high costs, and a lack of adequate surface figure control. In this paper, we present a novel approach for microlens array fabrication, using a projection lithography process with mask-shifting. The method employs a 0.2× projection objective lens to enhance linewidth resolution. By employing a projection-based mask-shift filtering technique, we achieve superior surface figure accuracy while reducing the complexity of mask preparation. The experimental results for four microlenses with different aperture sizes demonstrate surface figure accuracy in the submicron range and surface roughness at the nanometer level. In addition, 3D profilometer scanning equipment was employed to measure the surface roughness of these microlens arrays, and the measurement results of these microlens arrays processed using the proposed method for their surface roughness are 18.4 nm, 29.6 nm, 34.4 nm, and 56.1 nm. Our findings indicate that this method holds great potential in microlens array fabrication, offering the ability to achieve lower linewidths and higher surface figure accuracy compared to conventional methods.

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Rapid fabrication of bilayer graphene devices using direct laser writing photolithography

Cited by 14 publications

References 24 publications

Thionine Self-Assembled Structures on Graphene: Formation, Organization, and Doping

Thionine Self-Assembled Structures on Graphene: Formation, Organization, and Doping

Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

Mask-Shifting-Based Projection Lithography for Microlens Array Fabrication

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