2015
DOI: 10.1088/2053-1583/2/1/014006
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Rapid CVD growth of millimetre-sized single crystal graphene using a cold-wall reactor

Abstract: In this work we present a simple pathway to obtain large single-crystal graphene on copper (Cu) foils with high growth rates using a commercially available cold-wall chemical vapour deposition (CVD) reactor. We show that graphene nucleation density is drastically reduced and crystal growth is accelerated when: i) using ex-situ oxidised foils; ii) performing annealing in an inert atmosphere prior to growth; iii) enclosing the foils to lower the precursor impingement flux during growth. Growth rates as high as 1… Show more

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Cited by 151 publications
(171 citation statements)
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“…Circular holes were also investigated, as reported in the literature. 17,28 Large-scale monocrystalline graphene flakes used in the present work were obtained by CVD growth on Cu 29 and transferred on the Si 3 N 4 /Si chips using a standard "bubbling transfer" technique. 30 As sketched in Fig.…”
Section: The Implementation Of Arbitrary Strain Configurations By Desmentioning
confidence: 99%
“…Circular holes were also investigated, as reported in the literature. 17,28 Large-scale monocrystalline graphene flakes used in the present work were obtained by CVD growth on Cu 29 and transferred on the Si 3 N 4 /Si chips using a standard "bubbling transfer" technique. 30 As sketched in Fig.…”
Section: The Implementation Of Arbitrary Strain Configurations By Desmentioning
confidence: 99%
“…Due to safety concerns of introducing oxygen into a system containing highly combustible gases, as was done in the work cited above, we instead utilised the native oxides present in the low -purity Cu substrates [13]. To prevent the reduction of these oxides, annealing was performed in an inert argon atmosphere instead of hydrogen.…”
Section: Resultsmentioning
confidence: 99%
“…CVD synthesis of graphene Large-crystal graphene was synthesised on commerciallyavailable copper foil with a thickness of 25 µm (99.8% purity, Alfa-Aesar, 13382), which prior to growth was electropolished as described previously [13] in order to remove the surface contamination and improve the surface flatness. This foil is also referred to later in the text as low purity foil (i.e., with a high oxygen content).…”
Section: Methodsmentioning
confidence: 99%
“…Single-crystalline graphene flakes typically measuring 100 µm in diameter were grown by CVD on flat, ex situ passivated Cu foils. 21 Graphene crystals were finally deposited on the clean surfaces of LAO/STO heterostructures using a polymer-based transfer process 22 and localized, thanks to the Cr/Au markers. The device architecture was designed taking particular care to avoid spurious electrical losses across the ≈4 nm-thick LAO barrier.…”
mentioning
confidence: 99%