2017
DOI: 10.1007/978-3-319-58134-7_8
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Perfecting the Growth and Transfer of Large Single-Crystal CVD Graphene: A Platform Material for Optoelectronic Applications

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Cited by 6 publications
(2 citation statements)
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“…In the case of CVD grown graphene, the original substrate is the metallic substrate on which the graphene was grown. Removal of this substrate using chemical etchants exposes graphene to metal ions, which can potentially dope the graphene, changing its electronic properties [29]. One study measured a residual metallic contamination of greater than 10 13 atoms•cm −2 , regardless of the extensiveness of the post-etching cleaning procedure [22].…”
Section: Issues Arising In Graphene Transfermentioning
confidence: 99%
“…In the case of CVD grown graphene, the original substrate is the metallic substrate on which the graphene was grown. Removal of this substrate using chemical etchants exposes graphene to metal ions, which can potentially dope the graphene, changing its electronic properties [29]. One study measured a residual metallic contamination of greater than 10 13 atoms•cm −2 , regardless of the extensiveness of the post-etching cleaning procedure [22].…”
Section: Issues Arising In Graphene Transfermentioning
confidence: 99%
“…It is worth noting that both electrical and thermal contact between graphene and the directly deposited metallic thin film are much better than those of the conventional method by transferring graphene onto the fabricated electrodes. No residual air bubbles, contaminations or wrinkles were trapped between the metal and graphene [33][34][35][36][37] . In the fabrication process, the SiO 2 layer was removed by using a buffered hydrofluoric acid (BHF) through a micrometer sized window opened in the polymer resist layer.…”
Section: Synthesis Of Fluorinated Graphenementioning
confidence: 99%