The depth profiles of 25 -100-keV Ne+ and Ne+ ions itnp$anted into C, Si, V, Co, Ni, Zr, Nb, Ag, Hf, %', and Au backings have been measured with the (p, y) resonance broadening technique. The modal, mean, and standard-deviation values were determined for the range profiles extracted from the measured y-ray yield curves. The theoretical predictions were calculated with the computer-simulation code cosa"o for both amorphous and polycrystalline structures. The experimental modal ranges corrected for sputtering agree within error limits {& 10%%uo) with the ranges calculated, assuming an amorphous structure for the backing. The measured mean ranges are longer than theoretical values for an amorphous structure by a factor of 1.1 -1.3. However, the mean range predictions for a polycrystalline structure are generally closer to the experimental ones, although the shapes of profiles are somewhat different.