A series of dilute InNSb films with different N composition were prepared at various growth conditions by RF-MBE. The film samples were characterized by Atom force microscopy (AFM), high resolution X-ray diffraction (HRXRD) and room temperature Raman scattering spectroscopy, the measurements indicated that the InNSb films are of high crystalline quality and most of the N atoms are at the substituted Sb sites. I INTRODUCTION Dilute nitride alloys prepared by introducing a small mount of nitrogen to the III-V semiconductor matrix have attracted considerable attention for dramatic reduction of the fundamental band gap even to zero. The narrow band gap semiconductor have become the fundamental material for infrared detection technology[1]. It is always important to find some new narrow gap semiconductor. Recently, dilute InNSb alloy become more attractive due to its narrow band gap and Auger suppression property, it may be a kind of ideal material for the photo detectors sensitive to infrared radiation in 8-12um wave -length region [2-5]. However, due to the large difference in the size and electronegativity of Sb and N atom, it is a challenge to prepare high quality InNSb film with higher N composition. Little information have been reported about the effects of the growth parameters on the material quality and N composition, and lots problems require further research about this new material. II EXPERIMENT In this paper, InNSb films were grown on InSb(100) substrates by N 2 radio frequency plasma-assisted molecular beam epitaxy ( RF-MBE). An InSb buffer layer about 0.2 m was grown at 400 o C before the growth of the InNSb epitaxy. The III-V(In to Sb) flux ratios of the InNSb films are from 1:8 to 1:1.2. The InNSb films were grown at temperatures from 250 o C to 360 o C, and the RF powers from 350W to 420W. Two typical samples were chosen in the following discussion, the sample 1 and sample 2 were grown at 360 o C and 265 o C at the same RF power of 350W, with III-V flux ratios of 1:1.5 and 1:1.2, respectively. III RESULTS AND DISCUSSION Atom force microscopy (AFM), high resolution X-ray diffraction (HRXRD) and Raman spectroscopy measurements were used to analyze the crystalline quality and the N composition of the film samples. All the growth processes were monitored in-situ by RHEED.Fig.1 shows the AFM image of sample 1, the root mean square (rms) roughness of the film is only 0.236 nm, which exhibits a typical surface morphology of the film samples we prepared. The streaky RHEED patterns and smooth surface of the films indicate 2-dimensional growth of InNSb films. Although the rms values have little distinctions among the samples grown at different conditions, most of the sample surfaces are very smooth.Fig.1 AFM image of sample 1 Fig.2 shows XRD 2 / curves of the sample1 and sample2, In the figure, zinc blende-type InSb [004] and InNSb [004] peaks were clearly observed and the measurement results demonstrate that lattice strain in the films is tensile strain. It is well known that the crystal lattice will contract...