1996
DOI: 10.1007/bf02150173
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Radioactive probe atoms in semiconductors

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Cited by 9 publications
(1 citation statement)
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“…However, a major part of the activity is focused on the investigation of defects and impurities in semiconductors such as Si, Ge, III-V or II-VI compounds. Amongst the main topics of investigation are implantation-induced lattice damage and its annealing behaviour, the lattice site of the implanted ion, the interaction between impurities or impurities and intrinsic defects, the electronic and optical properties of the implanted species and the identification of defects and impurities [36][37][38][39][40][41].…”
Section: Introductionmentioning
confidence: 99%
“…However, a major part of the activity is focused on the investigation of defects and impurities in semiconductors such as Si, Ge, III-V or II-VI compounds. Amongst the main topics of investigation are implantation-induced lattice damage and its annealing behaviour, the lattice site of the implanted ion, the interaction between impurities or impurities and intrinsic defects, the electronic and optical properties of the implanted species and the identification of defects and impurities [36][37][38][39][40][41].…”
Section: Introductionmentioning
confidence: 99%