Radio frequency sputter deposition and properties of calcium fluoride thin films

Maréchal, N.; Quesnel, Etienne; Juliet, P.; Pauleau, Y.

doi:10.1063/1.354259

Cited by 15 publications

(5 citation statements)

References 11 publications

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“…13 Similar inhomogeneity in the preferred orientation of CaF 2 films prepared by rf sputtering has been discovered. 8 The inhomogeneities of compositions and optical properties for the other fluorides, such as MgF 2 , have also been reported. 14 Figure 2 shows that the differences in transmittance extreme decrease and increase with increasing TiO 2 content when the TiO 2 contents are lower than 10 at.…”

Section: Optical Propertiesmentioning

confidence: 95%

“…It has been shown that hardnesses of the films are strongly related to their microstructures, while the adhesion strengths depend on the interface layer between film and substrate. 4,8,10,15 The poor adhesion strength of pure CaF 2 films on glass substrates is probably due to the weak interaction between CaF 2 and SiO 2 . In contrast, the adhesion strength of TiO 2 film on the glass substrate is much stronger due to their mutural amorphicity.…”

Section: Hardness and Adhesionmentioning

confidence: 98%

“…1 CaF 2 thin films are usually prepared using various preparation techniques such as electron-beam deposition ͑EBD͒, 2,3 ion-assisted deposition ͑IAD͒, 4,5 molecular beam epitaxy, 6 and sputtering. 7,8 However, the characteristics of CaF 2 films strongly depend on fabrication methods and substrate temperatures. The fact that films deposited by conventional EBD processes at ambient substrate temperatures have inferior structural, optical, mechanical, and moisture resistant properties compared to those of the films deposited at high substrate temperatures ͑300 to 700°C͒ is attributed to moisture absorption due to the columnar microstructure.…”

Section: Introductionmentioning

confidence: 99%

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Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><roman>2</roman><roman>-TiO</roman><roman>2</roman></inline-formula> composite films prepared by reactive ion-assisted codeposition

Tsai

Shiau

et al. 1998

Opt. Eng

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The influences of TiO 2 contents on the structural, optical, mechanical, and moisture resistant properties of CaF 2 -TiO 2 composite films prepared by reactive ion-assisted codeposition are systematically investigated. The CaF 2 films deposited at an ambient substrate temperature are found to have superior optical, mechanical, and moisture resistant properties with the addition of 10 at. % TiO 2 . The structure of this film changes from polycrystalline CaF 2 to a mixed phase of amorphous TiO 2 and polycrystalline CaF 2 . The hardness of composite films containing 45 at. % TiO 2 is even higher than that of pure TiO 2 and glass, which is attributed to the isolation of the crystalline CaF 2 grains by the interconnection of the amorphous TiO 2 dispersoids. © 1998 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(98)

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Section: Optical Propertiesmentioning

confidence: 95%

Section: Hardness and Adhesionmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

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Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><roman>2</roman><roman>-TiO</roman><roman>2</roman></inline-formula> composite films prepared by reactive ion-assisted codeposition

Tsai

Shiau

et al. 1998

Opt. Eng

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“…Most of the above‐mentioned applications require the calcium fluoride material in the form of thin films. Several studies are available on the deposition of CaF 2 thin films using physical vapor deposition techniques, such as sputtering, electron beam evaporation, pulsed laser deposition, and molecular beam epitaxy . Calcium fluoride films have also been deposited through sol–gel chemical routes using spin coating or dip coating .…”

Section: Values Of the A‐axis Parameters Of The Caf2:yb3+ Er3+ Filmsmentioning

confidence: 99%

Nanostructured CaF₂:Ln³⁺ (Ln³⁺ = Yb³⁺/Er³⁺, Yb³⁺/Tm³⁺) Thin Films: MOCVD Fabrication and Their Upconversion Properties

Pellegrino

Cortelletti

Pedroni

et al. 2017

Adv Materials Inter

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it possible to collect the radiation energy outside the absorption range of the photoactive material (usually silicon) by shifting its energy to a more suitable optical region. In addition, rare-earth doped CaF 2 compounds are promising luminescent materials as phosphors and in technological applications as micro-and nanoscale thermometry for microelectronics and for biomedical assays. [4,[16][17][18] A comment deserves the CaF 2 structure, also in view of similar ionic size of the trivalent lanthanide ions, inserted as dopants, and the Ca 2+ ion. Calcium fluoride has the typical fluorite structure, following the name (fluorite) of the mineral form of CaF 2 , which is a simple cubic arrangement of anions with 50% cubic sites filled with Ca 2+ . Thus, in this structure, calcium is eight coordinated by fluoride ions, a coordination environment suitable for the lanthanide ions, being eight one of the most common coordination number for lanthanides. [19] Most of the above-mentioned applications require the calcium fluoride material in the form of thin films. Several studies are available on the deposition of CaF 2 thin films using physical vapor deposition techniques, such as sputtering, [20,21] electron beam evaporation, [22] pulsed laser deposition, [23,24] and molecular beam epitaxy. [25,26] Calcium fluoride films have also been deposited through sol-gel chemical routes using spin coating [27] or dip coating. [28] Among the chemical vapor deposition approaches, atomic layer deposition has been applied to the deposition of CaF 2 films. [29] Nevertheless, even though various deposition methods have been applied to the fabrication of CaF 2 films, a more versatile, easily scalable, fast, and industrially appealing approach is highly desirable.The metal organic chemical vapor deposition (MOCVD) has the potential advantage of being a very reliable and reproducible method for the fast production of films with high uniformity degree in both thickness and composition over large areas. In addition, note that in the case of potential integration of these layers in photovoltaic cell production, plasma-enhanced CVD is the most common fabrication method for thin film Si-based cells. [30] Calcium fluoride represents one of the most efficient hosts for up-conversion or down-conversion emissions. A simple metal organic chemical vapor deposition approach is applied to the fabrication of CaF 2 nanostructured thin films using the fluorinated "second-generation" β-diketonate compound Ca (hfa) 2 •diglyme•H 2 O as a Ca-F single-source precursor. The versatility of the process is demonstrated for the fabrication of up-converting Yb/Er or Yb/Tm codoped CaF 2 films on Si, quartz, and glass substrates. The Ln(hfa) 3 •diglyme (Ln = Tm, Er, Yb) precursors are used as sources of the doping ions. Structural, morphological, and compositional characterization of the films shows the formation of polycrystalline CaF 2 films with a very uniform surface and suitable doping. In fact, an appropriate tuning of the mixture composition, i.e., the Ca:Ln ...

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“…In the first, Cook et al attempted ambient temperature deposition of CaF 2 films by rf magnetron sputtering with a 2-in. 3 These films, grown by rf diode sputtering of a larger ͑15 cm͒ target, were found to be stable in air to 500°C and to have promising tribological characteristics, although again the films were found to be fluorine deficient ͑F/CaϽ1.85͒. 8 The films produced were not of high quality.…”

Section: Introductionmentioning

confidence: 99%

Radio frequency magnetron sputter deposition of CaF2 films

Dudney

1998

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inMorphology and structure evolution of tin-doped indium oxide thin films deposited by radio-frequency magnetron sputtering: The role of the sputtering atmosphere J. Appl. Phys. 115, 154905 (2014); 10.1063/1.4871810Copper nitride thin film prepared by reactive radio-frequency magnetron sputtering Properties of CeO 2 thin films deposited on Si(100) and Si(111) substrates by radio frequency-magnetron sputtering J.Relationship between plasma parameters and film microstructure in radio frequency magnetron sputter deposition of barium strontium titanate Calcium fluoride films have been deposited onto unheated (Ͻ100°C) substrates by low power rf magnetron sputtering of CaF 2 targets using Ar and Ne process gases at pressures of 0.5-2.7 Pa, biased and floating substrate potentials, and various geometries of the substrate with respect to the source. The thickness and composition of the films are very sensitive to resputtering of the growing film. Uniform and stoichiometric films were most readily obtained on off-axis substrates using two sputter sources oriented with the targets facing each other. The films were found to be crystalline, have a fine textured microstructure, and to be transparent and highly resistive.

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Radio frequency sputter deposition and properties of calcium fluoride thin films

Cited by 15 publications

References 11 publications

Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><sub><roman>2</roman></sub><roman>-TiO</roman><sub><roman>2</roman></sub></inline-formula> composite films prepared by reactive ion-assisted codeposition

Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><sub><roman>2</roman></sub><roman>-TiO</roman><sub><roman>2</roman></sub></inline-formula> composite films prepared by reactive ion-assisted codeposition

Nanostructured CaF₂:Ln³⁺ (Ln³⁺ = Yb³⁺/Er³⁺, Yb³⁺/Tm³⁺) Thin Films: MOCVD Fabrication and Their Upconversion Properties

Radio frequency magnetron sputter deposition of CaF2 films

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Radio frequency sputter deposition and properties of calcium fluoride thin films

Cited by 15 publications

References 11 publications

Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><sub><roman>2</roman></sub><roman>-TiO</roman><sub><roman>2</roman></sub></inline-formula> composite films prepared by reactive ion-assisted codeposition

Composition-dependent structural, optical, mechanical, and moisture resistant properties of <inline-formula><roman>CaF</roman><sub><roman>2</roman></sub><roman>-TiO</roman><sub><roman>2</roman></sub></inline-formula> composite films prepared by reactive ion-assisted codeposition

Nanostructured CaF2:Ln3+ (Ln3+ = Yb3+/Er3+, Yb3+/Tm3+) Thin Films: MOCVD Fabrication and Their Upconversion Properties

Radio frequency magnetron sputter deposition of CaF2 films

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Nanostructured CaF₂:Ln³⁺ (Ln³⁺ = Yb³⁺/Er³⁺, Yb³⁺/Tm³⁺) Thin Films: MOCVD Fabrication and Their Upconversion Properties