2000
DOI: 10.1016/s0040-6090(00)01160-3
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Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas

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Cited by 86 publications
(56 citation statements)
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“…The C (1s) peak profile for a specific set of plasma operating conditions was very reproducible regardless of the base substrate used (Au, Si, or HOPG) or the sample position in the plasma reactor during layer deposition. Similar results have been also reported in the literature for plasma deposition on Si substrates from a C 4 F 8 gas source but at different conditions [5][6][7] .…”
Section: S3supporting
confidence: 90%
“…The C (1s) peak profile for a specific set of plasma operating conditions was very reproducible regardless of the base substrate used (Au, Si, or HOPG) or the sample position in the plasma reactor during layer deposition. Similar results have been also reported in the literature for plasma deposition on Si substrates from a C 4 F 8 gas source but at different conditions [5][6][7] .…”
Section: S3supporting
confidence: 90%
“…31 The cubic phase of Cu 2 O is basically an interpenetrating network that may be stabilized by covalent Cu-Cu bonding. 44,45 The Cu-Cu interaction in the oxide requires a longer cutoff than was used by Yu et al, which in turn necessitates a refit of several parameters. The copper parameters at neutral charge are determined as the weighted least squares best fit to experimental cohesive energy and lattice parameter of the FCC ground state.…”
Section: Parameterization Of Atomic and Metallic Coppermentioning
confidence: 99%
“…The deposit of a non-homogeneous layer for treatment time less than about 80 s was responsible for the slow change in u H 2 O observed. Nevertheless, the polymerization time to obtain these hydrophobic coatings remains very short [19].…”
Section: Wettability Of the Surfacementioning
confidence: 99%
“…The deposition rate was in the range from 2 to 10 mg min À1 cm À2 for PFH and PFO, and from 5 to 30 mg min À1 cm À2 for NFH and TDFO. The more rapid deposition of the unsaturated monomers can be partly due to the high reactivity of the double bond [19].…”
Section: Wettability Of the Surfacementioning
confidence: 99%