2001
DOI: 10.1109/23.940096
|View full text |Cite
|
Sign up to set email alerts
|

Radiation hardness of VA1 with submicron process technology

Abstract: We have studied the radiation hardness of the VA1, a Viking-architecture preamplifier VLSI chip. Large-scale integrated (LSI) samples are fabricated in 0.8 and 0.35 m process technologies to improve the radiation hardness of the LSI for the Belle silicon vertex detector upgrade.We have observed significant improvement of the radiation hardness with 0.8-m technology compared to 1.2-m technology. Little degradation of noise and gain is observed up to a total dose of 20 Mrd for the VA1 fabricated in the 0.35-m te… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
9
0

Year Published

2004
2004
2022
2022

Publication Types

Select...
8

Relationship

4
4

Authors

Journals

citations
Cited by 23 publications
(9 citation statements)
references
References 6 publications
0
9
0
Order By: Relevance
“…These trapping charge also lead to the increase of noise [18]. However, especially for the chips fabricated with submicron CMOS technologies, they have a high degree of radiation tolerance, which does not seem to be compatible with the large noise increase shown in our experiment [19]. Fig.…”
Section: Radiation Tolerancementioning
confidence: 85%
“…These trapping charge also lead to the increase of noise [18]. However, especially for the chips fabricated with submicron CMOS technologies, they have a high degree of radiation tolerance, which does not seem to be compatible with the large noise increase shown in our experiment [19]. Fig.…”
Section: Radiation Tolerancementioning
confidence: 85%
“…By July 2003, the peak luminosity achieved was and the total integrated luminosity was 158. 6 . To extract the -violation parameters from the time-dependent asymmetry, the decay vertex positions have to be measured with an accuracy of several tens of micro-meters.…”
Section: Introductionmentioning
confidence: 99%
“…To improve the weak points, we have upgraded the SVD (SVD2) [3], [4] • Improvement of radiation hardness of the front-end electronics by using the VA1TA chip [5] implemented with a 0.35 process technology instead of VA1 chip with a 0.8 process in SVD1 [6], [7]. • Improvement of vertex resolution and tracking efficiency of charged particles especially in low transverse momentum region by reducing the radius of the innermost layer from 30 to 20 mm and by increasing the number of layers from three to four [8].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…It was replaced by the VA1TA chip [3] manufactured by IDEAS (http://www.ideas.no). The VA1TA is implemented in a 0.35 CMOS process, and it is expected to have a stable performance up to a radiation dose of at least 20 MRad [4].…”
mentioning
confidence: 99%