2021
DOI: 10.1016/j.nima.2020.164381
|View full text |Cite
|
Sign up to set email alerts
|

Radiation hard monolithic CMOS sensors with small electrodes for High Luminosity LHC

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
12
0

Year Published

2021
2021
2022
2022

Publication Types

Select...
7
2

Relationship

2
7

Authors

Journals

citations
Cited by 19 publications
(12 citation statements)
references
References 8 publications
0
12
0
Order By: Relevance
“…Complementary measurements with a focused x-ray beam at Diamond Light Source showed improved charge collection efficiency in the pixel corners with respect to the original process modification [7]. Subsequently, full size MALTA prototypes with the additional process modifications (NGAP and EDPW) were produced on Czochralski substrates, to aim for larger charge collection and higher depletion voltages, and showed almost full efficiency of samples irradiated to 1e15 n eq /cm 2 [8]. In the following we present a subset of these results focused on cluster size, tracking, and time resolution.…”
Section: The Malta Prototypesmentioning
confidence: 98%
“…Complementary measurements with a focused x-ray beam at Diamond Light Source showed improved charge collection efficiency in the pixel corners with respect to the original process modification [7]. Subsequently, full size MALTA prototypes with the additional process modifications (NGAP and EDPW) were produced on Czochralski substrates, to aim for larger charge collection and higher depletion voltages, and showed almost full efficiency of samples irradiated to 1e15 n eq /cm 2 [8]. In the following we present a subset of these results focused on cluster size, tracking, and time resolution.…”
Section: The Malta Prototypesmentioning
confidence: 98%
“…Challenges of this approach include the routing of the signals to the chip periphery and will depend on the technology chosen and the feature size of it. Some of these concepts have already been incorporated in ASICs such as the MALTA/Monopix chip [25] implemented in a modified Tower Jazz 180 nm process, and optimised for radiation hardness and speed [26], and were also included in the CLICTD sensor chip [27], optimised for extended efficiency for ultra-thin silicon trackers.…”
Section: Monolithic Cmos Mapsmentioning
confidence: 99%
“…The size of the active sensor volume is limited by the thickness of the 30 µm epitaxial layer. To increase the active volume, an alternative substrate material is studied, which consists of high-resistivity (few kΩ cm) p-type Czochralski silicon [7]. The implants are introduced directly on the Czochralski substrate and no additional epitaxial layer is grown on top.…”
Section: Sensor Materialsmentioning
confidence: 99%
“…High-resistivity substrate materials are therefore investigated as a possible replacement, extending both the bounded depletion and active sensor depth thus leading to a higher measured signal. In this document, a highresistivity Czochralski substrate as alternative wafer material is assessed, which has already proven to increase efficiency after irradiation in the small collection-electrode design [7].…”
Section: Introductionmentioning
confidence: 99%