2006
DOI: 10.1080/10420150500493501
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Radiation effects in SnO2–Si sensor structures

Abstract: The radiation resistance of SnO 2 -Si sensor structures irradiated by fast electrons and γ rays was studied. The radiation-induced structural changes were investigated using the Fourier transform infrared (FTIR) spectroscopy method. FTIR spectroscopy was used with grazing angles of light incidence on the surface of SnO 2 -Si structure. New bands or any other modifications in spectra for irradiated SnO 2 films were not observed. It was found that SnO 2 films reveal a high resistance to irradiation while structu… Show more

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Cited by 5 publications
(4 citation statements)
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“…Optical properties of the perovskite, Spiro-OMeTAD and SnO 2 functional layers remain unchanged under proton irradiation with the accumulated fluence up to 10 13 protons cm −2 . [16,45] Therefore, the photogeneration rate within the photodiode device is not effected by proton irradiation. This statement is supported by the same saturation photocurrent for the reference and irradiated devices at reverse bias (see Figure S3, Supporting Information).…”
Section: Resultsmentioning
confidence: 99%
“…Optical properties of the perovskite, Spiro-OMeTAD and SnO 2 functional layers remain unchanged under proton irradiation with the accumulated fluence up to 10 13 protons cm −2 . [16,45] Therefore, the photogeneration rate within the photodiode device is not effected by proton irradiation. This statement is supported by the same saturation photocurrent for the reference and irradiated devices at reverse bias (see Figure S3, Supporting Information).…”
Section: Resultsmentioning
confidence: 99%
“…The transport layer materials include the SnO 2 electron transport layer (ETL) and Spiro-OMeTAD hole transport layer (HTL). SnO 2 is considered to have excellent thermal stability and irradiation resistance because of its inorganic nature, , and thus the performance changes of Spiro-OMeTAD after different fluences of irradiation were mainly investigated.…”
Section: Resultsmentioning
confidence: 99%
“…Besides TiO x , dielectric metal oxides such as HfO 2 and TaO x have also been gaining attention due to their excellent switching properties, high compatibility with CMOS technologies, self-compliance, and self-rectifying behaviour, benefiting crossbar arrays 21 , 22 , 24 , 25 . However, semiconducting metal oxide such as SnO x received lesser attention, albeit it is abundant, low cost, exhibits excellent electronic transport properties and can be employed as transparent conducting oxide 26 28 . Additionally, the n-type semiconducting nature of SnO x attributed to the oxygen vacancies and its displacement resistance property (lower chance of single or multi-bit event upset) due to its high Frenkel defect energy (7 eV) can make tin-based oxide highly sought-out switching material for RRAM devices 10 , 28 .…”
Section: Introductionmentioning
confidence: 99%
“…However, semiconducting metal oxide such as SnO x received lesser attention, albeit it is abundant, low cost, exhibits excellent electronic transport properties and can be employed as transparent conducting oxide 26 28 . Additionally, the n-type semiconducting nature of SnO x attributed to the oxygen vacancies and its displacement resistance property (lower chance of single or multi-bit event upset) due to its high Frenkel defect energy (7 eV) can make tin-based oxide highly sought-out switching material for RRAM devices 10 , 28 .…”
Section: Introductionmentioning
confidence: 99%