2021
DOI: 10.18494/sam.2021.3425
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Radiation and Spontaneous Annealing of Radiation-sensitive Field-effect Transistors with Gate Oxide Thicknesses of 400 and 1000 nm

Abstract: We investigated the influence of gamma radiation of 50 Gy(H 2 O) on radiation-sensitive p-channel metal-oxide-semiconductor field-effect transistors with an Al gate (RADFETs) with gate oxide thicknesses of 400 and 1000 nm and gate voltages of 0 and 5 V. The obtained results showed that the sensitivity S at a given gate voltage increases with the square of the gate oxide thickness. After irradiation (IR), spontaneous annealing (SA) was performed at room temperature without voltage at the gate. We present the be… Show more

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Cited by 2 publications
(7 citation statements)
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“…It was also shown [6] that S is proportional to t ox 2 (S ∼ t ox 2 ), which can be seen in Table 1. Namely, for a given V G,i , S 1000 /S 400 ≈ 6.25 = 2.5 2 .…”
Section: Resultsmentioning
confidence: 71%
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“…It was also shown [6] that S is proportional to t ox 2 (S ∼ t ox 2 ), which can be seen in Table 1. Namely, for a given V G,i , S 1000 /S 400 ≈ 6.25 = 2.5 2 .…”
Section: Resultsmentioning
confidence: 71%
“…It is shown [6] that ΔN ft decreases, but ΔN st increases during SA. At the beginning of SA, the small negative fading, as a consequence of a greater increase in STs than a decrease in FTs, can be seen in Figure 1 for two transistor types.…”
Section: Resultsmentioning
confidence: 94%
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