Quasi-phase matching in periodically-grooved thin-film lithium niobate waveguides

Wang, Cheng; Xiong, X.; Andrade, Nicolas M.; Venkataraman, Vivek; Ren, Xinyi; Guo, Guang‐Can; Lončar, Marko

doi:10.1117/12.2247593

Cited by 2 publications

(2 citation statements)

References 31 publications

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“…Integrated photonics is widely employed in high bandwidth telecommunication [1], frequency conversion and filtering [2,3], biophotonics and sensing [4], and single photon generation and manipulation for quantum technology [5][6][7]. Important requirements of an attractive photonic platform are low propagation loss, high nonlinearities, high index contrast and industry compatible fabrication processes.…”

Section: Introductionmentioning

confidence: 99%

Ultra-low loss photonic circuits in lithium niobate on insulator

Krasnokutska¹,

Tambasco²,

Li³

et al. 2018

Opt. Express

161

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Lithium niobate on insulator (LNOI) photonics promises to combine the excellent nonlinear properties of lithium niobate with the high complexity achievable by high contrast waveguides. However, to date, fabrication challenges have resulted in high-loss and sidewall-angled waveguides, limiting its applicability. We report LNOI single mode waveguides with ultra low propagation loss of 0.4 dB/cm and sidewall angle of 75°. Our results open the route to a highly efficient photonic platform with applications ranging from high-speed telecommunication to quantum technology.

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Section: Introductionmentioning

confidence: 99%

Ultra-low loss photonic circuits in lithium niobate on insulator

Krasnokutska¹,

Tambasco²,

Li³

et al. 2018

Opt. Express

161

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show abstract

“…The e-beam resist mask usually has low selectivity to LN, so thick resist is normally required, however, this will greatly limit fabrication resolution and pattern density. Alternatively, multilayer masking schemes have been developed, such as stacking multiple e-beam resist layers or adding hard mask layers [e.g., nickel [31,32] , chromium (Cr) [33,34] , silicon [35,36] , or SiO 2 [37,38] ]. Although these methods provide the required selectivity, the multiple patterning, cleaning, and etching steps greatly increase the complexity of the process.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of lithium niobate metasurfaces via a combination of FIB and ICP-RIE

Jin

Cao

et al. 2022

Chin. Opt. Lett.

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Lithium niobate (LN) metasurfaces have emerged as a new platform for manipulating electromagnetic waves. Here, we report a fabrication technique for LN nano-grating metasurfaces by combining focused ion beam (FIB) milling with inductively coupled plasma reactive ion etching (ICP-RIE). Steep sidewalls with angles larger than 80°are achieved. Sharp quasi-bound states in the continuum are observed from our metasurfaces. The measured transmission spectra show good agreement with the numerical simulations, confirming the high quality of the fabricated metasurfaces. Our technique can be applied to fabricate the LN metasurfaces with sharp resonances for various applications in optical communications, on-chip photonics, laser physics, sensing, and so on.

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Quasi-phase matching in periodically-grooved thin-film lithium niobate waveguides

Cited by 2 publications

References 31 publications

Ultra-low loss photonic circuits in lithium niobate on insulator

Ultra-low loss photonic circuits in lithium niobate on insulator

Fabrication of lithium niobate metasurfaces via a combination of FIB and ICP-RIE

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