1973
DOI: 10.1103/physrevb.7.1479
|View full text |Cite
|
Sign up to set email alerts
|

Quantum Dielectric Theory of Electronegativity in Covalent Systems. III. Pressure-Temperature Phase Diagrams, Heats of Mixing, and Distribution Coefficients

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

10
125
2
3

Year Published

1999
1999
2012
2012

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 462 publications
(140 citation statements)
references
References 107 publications
10
125
2
3
Order By: Relevance
“…This rule is also valid for GaN growth, where the GaN melting point lies somewhere between 2540 K (experimentally determined for 6 GPa [23]) and 2800 K (theoretically calculated [24]), and the optimum growth temperature used in MOVPE is in the range 1050-1100 1C (1320-1370 K). On a microscopic scale, at T=0.5 Á T M atomic kinks start to become active, i.e.…”
Section: Growth Conditions For Pambementioning
confidence: 99%
“…This rule is also valid for GaN growth, where the GaN melting point lies somewhere between 2540 K (experimentally determined for 6 GPa [23]) and 2800 K (theoretically calculated [24]), and the optimum growth temperature used in MOVPE is in the range 1050-1100 1C (1320-1370 K). On a microscopic scale, at T=0.5 Á T M atomic kinks start to become active, i.e.…”
Section: Growth Conditions For Pambementioning
confidence: 99%
“…Bulk GaN crystals, however, are difficult to grow from its stoichiometric melt either by Czochralski or Bridgman method due to its extremely high decomposition pressures [5] and high theoretical melting temperature [6]. Attempts have been tried to grow the bulk crystals by the sublimation method [7], the hydride vapor-phase epitaxy (HVPE) method [8], the high-pressure solution growth method [9] and the flux method using sodium [10].…”
Section: Introductionmentioning
confidence: 99%
“…Melting of large single crystals was indicated by a change of the shape and microstructure. In the case of small crystals the appearance of a liquid phase in the system was fixed either by the formation of a strong monolith sample with a pronounced laminar structure after quenching (samples, which did not achieve the melting temperature, remained brittle compacts of relatively large crystals) or in situ from a jump of the cell electrical resistance caused by a change of conductivity type from the semiconducting (solid SiC) to the metal one (melt) [3,4,10]. In the second case boron nitride capsules were not used and the sample was in a direct contact with a graphite heater.…”
mentioning
confidence: 99%