Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Dettmann, Wolfgang; Heumann, Jan; Hagner, Tanja; Koehle, Roderick; Rahn, S.; Verbeek, Martin; Zarrabian, Mardjan; Weckesser, Jens; Hennig, Mario; Morgana, Nicolo

doi:10.1117/12.504202

Cited by 2 publications

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“…Therefore, the AIMS tool gives information about the optical performance and printing characteristics of the photomask without carrying out full wafer resist exposures, followed by scanning electron microscope (SEM) measurements of the printed features [1]. This means that one can characterize the printability of mask defects [2]. This is currently the main application for an AIMS tool.…”

Section: Introductionmentioning

confidence: 99%

First results from AIMS beta tool for 157-nm lithography

Teuber

Higashikawa²,

Urbach³

et al. 2004

SPIE Proceedings

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In modern mask manufacturing, a successful defect mitigation strategy has been become crucial to achieve defect free masks for high-end lithography. The basic steps of such a strategy include inspection, repair, and subsequent post-repair qualification of repair sites. For the latter task, actinic aerial image measurements have been proven to be the technique of choice to assess the printability of a repaired site. In the last three years, International SEMATECH in cooperation with Infineon/AMTC-Dresden and SELETE, funded a joint development project at Carl Zeiss to develop an AIMS  tool operating at the 157nm wavelength. The three beta tools were shipped in 2003 to the three beta customer sites. In this paper are presented the first results obtained with these beta tools, including measurements on binary as well as alternating phase shift masks. The technical properties of the tool were discussed with regards to the capability of the tool for defect qualification on photomasks. Additionally, preliminary results of the evaluation of alternating phase shift masks will be discussed, including measurements performed on dense lines-and-spaces structures with various pitch sizes.

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Section: Introductionmentioning

confidence: 99%