Summary• Jasmonic acid (JA) is a plant signalling compound that has been implicated in the regulation of mutualistic symbioses. In order to understand the spatial distribution of JA biosynthetic capacity in nodules of two actinorhizal species, Casaurina glauca and Datisca glomerata, and one legume, Medicago truncatula, we determined the localization of allene oxide cyclase (AOC) which catalyses a committed step in JA biosynthesis. In all nodule types analysed, AOC was detected exclusively in uninfected cells.• The levels of JA were compared in the roots and nodules of the three plant species. The nodules and noninoculated roots of the two actinorhizal species, and the root systems of M. truncatula, noninoculated or nodulated with wild-type Sinorhizobium meliloti or with mutants unable to fix nitrogen, did not show significant differences in JA levels. However, JA levels in all plant organs examined increased significantly on mechanical disturbance.• To study whether JA played a regulatory role in the nodules of M. truncatula, composite plants containing roots expressing an MtAOC1-sense or MtAOC1-RNAi construct were inoculated with S. meliloti. Neither an increase nor reduction in AOC levels resulted in altered nodule formation.• These data suggest that jasmonates are not involved in the development and function of root nodules.
Die für die Darstellung von gleichteiligen Silberhydrosolen besten Mengenverhältnisse werden zusammengestellt für das Arbeiten mit 0,001% iger Silberoxydlösung.
Alternating phase shift masks (altPSM) are gaining importance as a reticle enhancement technique to meet the ITRS Litho Roadmap sub-130 nm node line widths. AltPSM fabrication usually involves etching of the quartz substrate in order to form the phase shift structures. Defects can arise during the quartz-etching step from imperfections in the resist image thereby causing various forms of phase shifting defects on the reticle. These reticle phase shift defects can result in printable defects on the wafer. In order to prevent wafer yield loss from occurring, it is necessary to detect and repair the reticle defects. A die-to-die inspection algorithm using simultaneous transmitted and reflected light signals was developed for the KLA-Tencor TeraStar SLF27 inspection system. The algorithm processes the transmitted and reflected light signals in parallel to detect both phase and chrome defects at high speed. One of the several challenges in the use of reflected light for pattern defect detection on alternating phase shift masks is to ignore lithographically insignificant mask process artifacts such as bright chrome 'halos' which may exhibit significant differences between adjacent die. This paper discusses the inspection challenges of alternating phase shift masks. Defect sensitivity characterization results from programmed phase defect reticles are presented.
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