2003
DOI: 10.1007/978-3-540-44838-9_36
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Pulsed Laser Deposition (PLD) -- A Versatile Thin Film Technique

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Cited by 149 publications
(89 citation statements)
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“…A technique that has been increasingly applied for obtaining thin layers is the so-called Pulse Layer Deposition (PLD) [6]- [8]. Due to its versatility, this technique has extended to include the deposition of a great number of materials, ranging from pure elements to multicomponent compounds [9] [10].…”
Section: Introductionmentioning
confidence: 99%
“…A technique that has been increasingly applied for obtaining thin layers is the so-called Pulse Layer Deposition (PLD) [6]- [8]. Due to its versatility, this technique has extended to include the deposition of a great number of materials, ranging from pure elements to multicomponent compounds [9] [10].…”
Section: Introductionmentioning
confidence: 99%
“…Deposition methods of choice include vapour deposition techniques Bhat et al, 2003), sputtering Bauer et al, 2003), pulsed laser deposition (Krebs et al, 2003) and solution casting (Park & Xia, 1999;Su, 2004;Narayanan et al, 2004). All these methods aim to produce a large and homogeneous surface area.…”
Section: Introductionmentioning
confidence: 99%
“…Since the laser energy source is located outside the deposition chamber; the use of either ultrahigh vacuum or ambient gas becomes possible (Krebs et al, 2003). Combined with a stoichiometry transfer between ablated target and substrate where the material is deposited, this flexibility allows depositing theoretically all possible kinds of materials, including polymers or fullerenes (Eason et al, 2006).…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%