2005
DOI: 10.1016/j.jmmm.2005.03.066
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Pulsed laser deposition of Sr2FeMoO6 thin films

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Cited by 6 publications
(11 citation statements)
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“…Only one report used pure Si(100) as substrate . To reduce lattice mismatch, SrTiO 3 (001) substrates were covered with PLD Ba 0.4 Sr 0.6 TiO 3 (001) or with spark plasma‐sintered polycrystalline Sr 2 MgWO 6 . The study in ref.…”
Section: Film Deposition Methodsmentioning
confidence: 99%
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“…Only one report used pure Si(100) as substrate . To reduce lattice mismatch, SrTiO 3 (001) substrates were covered with PLD Ba 0.4 Sr 0.6 TiO 3 (001) or with spark plasma‐sintered polycrystalline Sr 2 MgWO 6 . The study in ref.…”
Section: Film Deposition Methodsmentioning
confidence: 99%
“…Contrarily, compressive strain was found to reduce the antisite disorder favoring device application in spintronics, but also to increase ASD thereby decreasing magnetization . Experimentally, a decrease of compressive strain by means of a Ba 0.4 Sr 0.6 TiO 3 buffer layer has been found to improve M s …”
Section: Phase Stability and Point Defects In Sr2femoo6−δmentioning
confidence: 96%
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“…The most used and optimized method for the growth of SFMO thin film is pulsed laser deposition (PLD) [57][58][59][60][61][62][63][64][65][66][67][68][69][70][71], however due to inherent complexity of SFMO, its growth as a thin film, has proven to be an arduous task. A brief look through the vast array of SFMO thin film literature reveals that the growth conditions are still in need of perfection [72][73][74][75][76][77][78][79][80][81][82][83]. The substrate temperature, vacuum, oxygen partial pressure, and gas atmosphere vary from one reference to the next, making it difficult to ascertain the optimal set of growth conditions for SFMO thin films.…”
Section: Sfmo Thin Films and Magnetic Tunnel Junctions For Room Tempementioning
confidence: 99%