2007
DOI: 10.1016/j.surfcoat.2007.03.006
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Pulsed laser deposition of antifriction thin-film MoSex coatings at the different vacuum conditions

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Cited by 34 publications
(19 citation statements)
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“…The buffer gas, in particular, the argon pumped into the deposition chamber enables to raise the chalcogen concentration in the DTM coating by reducing the energy of the deposited flux [10]. The tentative study [11] that it may improve the antifriction properties of coat ings by reducing the coefficient of friction. It is estab lished in [11] that the buffer gas ensures growth of coatings with the laminar structure, which has basic planes predominantly oriented parallel to the substrate surface.…”
Section: Introductionmentioning
confidence: 92%
“…The buffer gas, in particular, the argon pumped into the deposition chamber enables to raise the chalcogen concentration in the DTM coating by reducing the energy of the deposited flux [10]. The tentative study [11] that it may improve the antifriction properties of coat ings by reducing the coefficient of friction. It is estab lished in [11] that the buffer gas ensures growth of coatings with the laminar structure, which has basic planes predominantly oriented parallel to the substrate surface.…”
Section: Introductionmentioning
confidence: 92%
“…MoSe 2 is more resistant to oxidation in humid ambient conditions than molybdenum sulfide [3]. Although, a variety of films are deposited by several techniques [4][5][6][7][8][9], deposition by magnetron sputtering has become increasingly popular. In this method, the deposition parameters can be empirically optimised by changing discharge power, gas pressure, position of the substrate relative to the sputtered target, bias voltage and substrate temperature [10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…In this method, the deposition parameters can be empirically optimised by changing discharge power, gas pressure, position of the substrate relative to the sputtered target, bias voltage and substrate temperature [10][11][12][13]. Comparing molybdenum disulfides and diselenides, the metal to chalcogen mass ratio is closer to 1 in the latter case [4], and this limits the re-sputtering of selenium from the coating. Therefore, a higher chalcogen-metal ratio compared to sputtered Mo-S could be expected.…”
Section: Introductionmentioning
confidence: 99%
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“…Weak bombardment is necessary for activating the basal plane surface, which is inert at a quality (defect free) atomic packing. The optimum bombardment condi tions can also be implemented at PLD in a buffer gas at a certain pressure [13].…”
Section: Pld In a Standard Configurationmentioning
confidence: 99%