2013
DOI: 10.3103/s1068366613040053
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Structural modification and tribological behavior improvement of solid lubricating WSe x coatings during pulsed laser deposition in buffer He-Gas

Abstract: Thin film, solid lubricating WSe x coatings were deposited at room temperature on a steel substrate with a titanium underlayer by pulsed laser deposition (PLD). Two modes of PLD were investigated, i.e., the PLD under vacuum conditions and the PLD in a buffer gas (helium) at a pressure of 2-10 Pa. Gas was used to slow down the laser induced atomic flux and to modify thus the conditions of the coatings growth. At a pressure ~8 Pa, gas reduced the effectiveness of Se preferential sputtering by atomic flux, which … Show more

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Cited by 3 publications
(4 citation statements)
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“…We note that the contrast of the amorphous matrix of the C-Ti-WSe x films in the TEM examinations is much similar to the contrast of the unalloyed WSe x films found in [10]. This contrast includes bright and dark filamentous fragments typical of the laminar structure of TMD materials.…”
Section: Resultssupporting
confidence: 72%
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“…We note that the contrast of the amorphous matrix of the C-Ti-WSe x films in the TEM examinations is much similar to the contrast of the unalloyed WSe x films found in [10]. This contrast includes bright and dark filamentous fragments typical of the laminar structure of TMD materials.…”
Section: Resultssupporting
confidence: 72%
“…The coefficient of the wear of the ball does not The examination of the wear scar on the ball after sliding against the composite coating shows that wear products stick to the counterface and form a dense tri bofilm on the leading side of the ball (from the side of the direction of motion). A similar pattern of changes on the counterface was observed in [10] after the tri botests of unalloyed WSe x coatings. After friction against the a C(Ti) coating, friable wear products appear, and no cushion of wear products is formed on the counterface.…”
Section: Resultsmentioning
confidence: 59%
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“…It is a kind of physical vapor deposition technique which has controllable deposition parameters, including laser energy, repetition rate, substrate temperature, deposition time, gas flux as well as target-substrate distance. Growth conditions such as deposition atmosphere [18,19], repetition rate [20] and substrate temperature [21][22][23] can hugely modify the crystalline quality, microstructure, thickness, surface morphology and mechanical properties of films, which have been investigated in great detail. In previous study, Lippert [21] used the PLD technique to fabricate the yttria-stabilized zirconia (YSZ) films at room and high temperatures, which exhibited a uniform isotropic structure in the case of room temperature deposition and an oriented columnar growth at substantially higher substrate temperatures of 400-700 • C. Matei [23] fabricated the vanadium nitride films at room temperature and 500 • C by the PLD technique.…”
Section: Introductionmentioning
confidence: 99%