“…It is a kind of physical vapor deposition technique which has controllable deposition parameters, including laser energy, repetition rate, substrate temperature, deposition time, gas flux as well as target-substrate distance. Growth conditions such as deposition atmosphere [18,19], repetition rate [20] and substrate temperature [21][22][23] can hugely modify the crystalline quality, microstructure, thickness, surface morphology and mechanical properties of films, which have been investigated in great detail. In previous study, Lippert [21] used the PLD technique to fabricate the yttria-stabilized zirconia (YSZ) films at room and high temperatures, which exhibited a uniform isotropic structure in the case of room temperature deposition and an oriented columnar growth at substantially higher substrate temperatures of 400-700 • C. Matei [23] fabricated the vanadium nitride films at room temperature and 500 • C by the PLD technique.…”