Pulsed electrodeposition of layered brass structures

Weil, R.; Nee, C. C.; Chang, JW

doi:10.1007/bf02674031

Cited by 15 publications

(5 citation statements)

References 11 publications

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“…Electrodeposition of multilayer films from a solution containing the ions of two components is achieved by modulation of the potential or current and usually results in the deposition of a compositionally modulated multilayer with a bilayer repeat unit of the form A x B 1Ϫx /A y B 1Ϫy . Systems that have been studied include Cu x Bi 1Ϫx /Cu y Bi 1Ϫy , 1 Cu x Zn 1Ϫx /Cu y Zn 1Ϫy , 2 and Ni x Mo 1Ϫx /Ni y Mo 1Ϫy . 3 In these systems the compositional modulation was relatively small, typically less than 30 atom %.…”

mentioning

confidence: 99%

Deposition of Au[sub x]Ag[sub 1−x]/Au[sub y]Ag[sub 1−y] Multilayers and Multisegment Nanowires

Oskam

Ding

et al. 2003

J. Electrochem. Soc.

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Au x Ag 1Ϫx /Au y Ag 1Ϫy multilayers and multisegment nanowires were deposited from a single solution containing KAu(CN) 2 , KAg(CN) 2 , and Na 2 CO 3 ͑pH 13͒. Cyclic voltammograms for deposition from solutions containing Au(CN) 2 Ϫ and Ag(CN) 2 Ϫ show the characteristic deposition peaks for gold and silver. The composition of the deposited alloys is dependent on the deposition potential ͑or current͒ and solution chemistry. Multisegment nanowires were prepared by sequential deposition at Ϫ0.7 and Ϫ1.2 V from solutions containing Au(CN) 2 Ϫ and Ag(CN) 2 Ϫ solution in porous Al 2 O 3 templates. The different segments deposited at Ϫ0.7 and Ϫ1.2 V are clearly distinguished by scanning electron microscopy and optical microscopy under blue light illumination.

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confidence: 99%

Deposition of Au[sub x]Ag[sub 1−x]/Au[sub y]Ag[sub 1−y] Multilayers and Multisegment Nanowires

Oskam

Ding

et al. 2003

J. Electrochem. Soc.

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“…posited to any desired thickness of the second layer without reaching the second transition to some other electrochemical process (hydrogen evolution). This points to the necessity for Co,2 > > Co,~ [6] the best choice being that C0,2 Cog j(1D j(D [7] The thickness of the second layer should be {~ }T(II)-~, a(II) = J~ + M~. [j(II) -s ~F or, for the rotating disk hydrodynamics at a rotation speed (9…”

Section: Resultsmentioning

confidence: 99%

“…Reduced friction coefficient was found also in a laminar structure composed of a-and ~-brass (7). Other metal pairs were also tested [copper-bismuth (8), copper-cobalt (9), and silver-palladium (i0)].…”

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confidence: 99%

Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition: II . Dual Current Pulse Galvanostatic Technique

Despić

Jović

Spaić

1989

J. Electrochem. Soc.

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A dual current pulse technique was developed for plating two layers of different metals, or any number of pairs of layers, from a single bath. The key condition is to maintain the current density from the first current pulse below the diffusion limiting current density of discharge of the more noble metal and that from the second pulse well above the former and below the limiting current density of deposition of the less noble metal. If the content of the first metal in the second layer is to be small, the concentration of its ions in solution must be much smaller than that of the ions of the second metal. Example of plating several layers of copper and nickel upon each other is given.

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“…Thin-layered films consisting of alternate layers of two or more different materials or alloys exhibit some unique and promising magnetic [1,2], mechanical [3][4][5][6][7] and electrical [8,9] properties, which significantly differ from those of their base metals and alloys. When a multilayer consists of very thin alternate layers of ferromagnetic and nonmagnetic metals, its electrical resistance varies with applied magnetic field.…”

Section: Introductionmentioning

confidence: 99%