1989
DOI: 10.1149/1.2096987
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Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition: II . Dual Current Pulse Galvanostatic Technique

Abstract: A dual current pulse technique was developed for plating two layers of different metals, or any number of pairs of layers, from a single bath. The key condition is to maintain the current density from the first current pulse below the diffusion limiting current density of discharge of the more noble metal and that from the second pulse well above the former and below the limiting current density of deposition of the less noble metal. If the content of the first metal in the second layer is to be small, the con… Show more

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Cited by 48 publications
(13 citation statements)
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“…The bath composition and its operating conditions are listed in Table I. Trisodium citrate was chosen as the complexing agent because of several reasons: it provides a low surface roughness for the deposited samples; it decreases the amount of stress in Ni rich alloys at higher current densities; it has inherently less toxic nature, also found to act as a leveling agent, 26 a brightening agent 14 and a buffering agent. 27 The electrolyte solutions were prepared from analytical grade purity chemicals and distilled water and the pH was adjusted to a value of 4 using H 2 SO 4 .…”
Section: Methodsmentioning
confidence: 99%
“…The bath composition and its operating conditions are listed in Table I. Trisodium citrate was chosen as the complexing agent because of several reasons: it provides a low surface roughness for the deposited samples; it decreases the amount of stress in Ni rich alloys at higher current densities; it has inherently less toxic nature, also found to act as a leveling agent, 26 a brightening agent 14 and a buffering agent. 27 The electrolyte solutions were prepared from analytical grade purity chemicals and distilled water and the pH was adjusted to a value of 4 using H 2 SO 4 .…”
Section: Methodsmentioning
confidence: 99%
“…However, many studies show that sound alloy thin films are fabricated from citrate‐based electrolytes in which citrate acts as complexing agent because of its higher buffer capacity . Citrate ion can also be used as leveling agent , brightening agent , and buffering agent . Priscott (in 1959) had first used citrate baths to fabricate Ni‐Cu alloy thin films and studied the influence of plating parameters such as current density, temperature, and agitation of solution on the composition of the deposit.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the process might be more time consuming and difficult to automate in comparison to the alternate technique. In SBT, the metal ions required to form both deposit layers are contained in the single electrolyte and the alloy deposition is achieved by alternately changing the plating current/ potential, possibly in combination with a modulation of the mass transport towards the cathode [9][10][11]. Although significant success has been achieved with the SBT, the selection of constituents is limited because their deposition potentials must be sufficiently different to allow a separate deposition of each.…”
Section: Introductionmentioning
confidence: 99%