Prototype raster multibeam lithography tool

Coyle, S. T.; Holmgren, Douglas E.; Chen, X.; Thomas, Timothy A.; Sagle, A.; Maldonado, Juan R.; Shamoun, Bassam; Allen, Paul C.; Gesley, Mark

doi:10.1116/1.1520574

Cited by 9 publications

(3 citation statements)

References 3 publications

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“…The multi-photocathode reduction system shown in Fig. 1 (g) 6) ⑦ and the multi-photocathode 1:1 system 7) ⑧ shown in (h) use multi-photocathodes. The MPEBW systems discussed in the following are categorized as active matrix multi-electron emitters, as follows: (i) shows an active matrix multi-electron emitter reduction system 8) ⑨ and (j) shows an active matrix multi-electron emitter 1:1 system 9) ⑩.…”

Section: Electron Beam Lithography Systemsmentioning

confidence: 99%

Development of a massively parallel electron beam write (MPEBW) system: aiming for the digital fabrication of integrated circuits

Esashi

Miyaguchi

Kojima

et al. 2022

Jpn. J. Appl. Phys.

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Prototype of Massive Parallel Electron Beam Write (MPEBW) system has been developed for mask-less (direct write) lithography. A 100╳100 array of nanocrystalline–silicon (nc-Si) electron emitter is controlled by active matrix driving LSI. It is designed that arrayed electron beams are reduced to 1/100 by electron optics and focused on the wafer with 10 nm square spots. The electron beam emitter has a function of aberration correction. Planer type 10 μm square nc-Si emitter array and the driving LSI was fabricated and their operations were confirmed. A 17╳17 nc-Si emitter array was assembled with driver circuits and its active matrix electron beam exposure was performed using 1:1 exposure test system. Pierce type emitter array for active matrix drive is the subject for target commercial system. The operations of the Pierce type emitter array were studied with basic prototyping and simulation.

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Section: Electron Beam Lithography Systemsmentioning

confidence: 99%

Development of a massively parallel electron beam write (MPEBW) system: aiming for the digital fabrication of integrated circuits

Esashi

Miyaguchi

Kojima

et al. 2022

Jpn. J. Appl. Phys.

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“…3 Vector-scan Gaussian-beam systems 4,5 have not been accepted in maskmaking, multibeam systems [6][7][8][9][10][11][12] are still in the research and development phase. In raster scan, 1 the beam scans back and forth over the entire exposure area, turning on when it is over a pattern feature.…”

Section: Writing Strategiesmentioning

confidence: 99%

Writing strategy and electron-beam system with an arbitrarily shaped beam

Babin

2004

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inFacile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing J. Vac. Sci. Technol. B 31, 06F602 (2013); 10.1116/1.4822016Variable cell projection as an advance in electron-beam cell projection system Development of an electron-beam lithography system for high accuracy masks Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography J.Chrome on glass mask writing at 75 kV with the IBM EL4+electron-beam systemThe greatly increased complexity of modern masks has in turn led to increased write times and cost of the masks. Any opportunity to decrease write time while providing the required accuracy of the fabricated pattern is highly beneficial. A writing strategy using an arbitrarily shaped beam (ASB) results in a considerably smaller number of flashes to write a complex pattern compared to other strategies. The design of an ASB system is proposed. The ASB electron-beam column is similar to that of a variable-shaped beam system, except for a modified beam-shaping block. This suggests the relatively easy integration of an ASB column. The throughput of an ASB system is higher than the throughput of other systems, except for patterns with low coverage or simple geometries. In addition to the throughput advantages, an ASB system enables higher accuracy, including the feasibility of writing features according to "ideal" optical proximity correction.

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“…This enables the tailoring of the substrate's performance and its optical properties. In addition, a number of high-throughput EBL systems are currently under development, [30][31][32] which would allow the rapid commercialization and mass-scale production of nanolithographic-MNs, thus considerably lowering fabrication time and costs. The ability to tailor MNs' morphology through either controlling the deposition parameters, EBL or a combination of both offers two major opportunities: (1) enabling the optimization of the Raman excitation frequency without other spectral interferences such as background fluorescence; (2) nanostructuring of the polymeric surface to improve selectivity toward a specific target or class of compounds (e.g., antimicrobials, peptides, proteins, etc.)…”

Section: Introductionmentioning

confidence: 99%

Performance Characteristics of Bio-Inspired Metal Nanostructures as Surface-Enhanced Raman Scattered (SERS) Substrates

et al. 2016

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The fabrication of high-performance plasmonic nanomaterials for bio-sensing and trace chemical detection is a field of intense theoretical and experimental research. The use of metal-silicon nanopillar arrays as analytical sensors has been reported with reasonable results in recent years. The use of bio-inspired nanocomposite structures that follow the Fibonacci numerical architecture offers the opportunity to develop nanostructures with theoretically higher and more reproducible plasmonic fields over extended areas. The work presented here describes the nanofabrication process for a series of 40 µm × 40 µm bio-inspired arrays classified as asymmetric fractals (sunflower seeds and romanesco broccoli), bilaterally symmetric (acacia leaves and honeycombs), and radially symmetric (such as orchids and lily flowers) using electron beam lithography. In addition, analytical capabilities were evaluated using surface-enhanced Raman scattering (SERS). The substrate characterization and SERS performance of the developed substrates as the strategies to assess the design performance are presented and discussed.

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Prototype raster multibeam lithography tool

Abstract: Articles you may be interested inProgress toward a raster multibeam lithography tool

Cited by 9 publications

References 3 publications

Development of a massively parallel electron beam write (MPEBW) system: aiming for the digital fabrication of integrated circuits

Development of a massively parallel electron beam write (MPEBW) system: aiming for the digital fabrication of integrated circuits

Writing strategy and electron-beam system with an arbitrarily shaped beam

Performance Characteristics of Bio-Inspired Metal Nanostructures as Surface-Enhanced Raman Scattered (SERS) Substrates

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