2005
DOI: 10.1016/j.nima.2005.05.048
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Properties of TiN and TiZrV thin film as a remedy against electron cloud

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Cited by 49 publications
(63 citation statements)
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“…In this work, it was done in the higher residual pressure of the load lock chamber, to speed up the process. Gas exposure, in this work, is listed in "day equivalents" of the measurement chamber for easy comparison with the earlier work [1]. Scaling linearly, 1 s spent in the load lock correspond to 100 s spent in the measurement system, for a total pressure in the load lock being 100 times the one in the measurement system.…”
Section: Results Tizrvmentioning
confidence: 99%
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“…In this work, it was done in the higher residual pressure of the load lock chamber, to speed up the process. Gas exposure, in this work, is listed in "day equivalents" of the measurement chamber for easy comparison with the earlier work [1]. Scaling linearly, 1 s spent in the load lock correspond to 100 s spent in the measurement system, for a total pressure in the load lock being 100 times the one in the measurement system.…”
Section: Results Tizrvmentioning
confidence: 99%
“…XPS analysis from the as-received state (air-exposed getter film) to the activated state has already be discussed elsewhere [1,14,17]. XPS results on re-contamination in vacuum has also been documented with regard to the variation of the SEY [1]. We focus here, instead, on the evolution of the surface under N As contamination by the residual gas occurs, mainly by dissociative adsorption of oxygen on the metallic NEG, the 285 eV peak increases and get broadened to higher BE.…”
Section: Results Tizrvmentioning
confidence: 99%
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“…The lowest SEY of TiN coating is about 1.5 [14,15], where the coating quality control is a critical issue. The application results of TiN coating at PSR is mixed [16].…”
Section: Seymentioning
confidence: 99%