2006
DOI: 10.1016/j.nima.2006.03.041
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The effect of gas ion bombardment on the secondary electron yield of TiN, TiCN and TiZrV coatings for suppressing collective electron effects in storage rings

Abstract: In many accelerator storage rings running positively charged beams, multipactoring due to secondary electron emission (SEE) in the beam pipe will give rise to an electron cloud which can cause beam blow-up or loss of the circulating beam. A preventative measure that suppresses electron cloud formation is to ensure that the vacuum wall has a low secondary emission yield (SEY). The SEY of thin films of TiN, sputter deposited Non-Evaporable Getters and a novel TiCN alloy were measured under a variety of condition… Show more

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Cited by 25 publications
(22 citation statements)
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“…• TiN coating [20][21][22][23], which reduces the secondary emission yield (SEY) of the coated chamber.…”
Section: Cloud Mitigationmentioning
confidence: 99%
“…• TiN coating [20][21][22][23], which reduces the secondary emission yield (SEY) of the coated chamber.…”
Section: Cloud Mitigationmentioning
confidence: 99%
“…Note that in the apparatus, the SEY is measured with the use of an electron beam incoming at a 23° angle with respect to the sample surface normal. The SEY of technical surfaces material for accelerator vacuum chamber has been measured in the past at CERN [11,12] at KEK [13,14,15] SLAC [9,16,17] and at other laboratories [18]. 4…”
Section: Secondary Electron Yield Seymentioning
confidence: 99%
“…The impact of particles on a metallic surface reduces the surface SEY to low values [9][10][11][12][13][14][15][16][17]. This effect is known as conditioning.…”
Section: Sey Threshold and Requirementsmentioning
confidence: 99%
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“…Titanium-Zirconium-Vanadium (TiZrV) as one of nonevaporable getters (NEGs) [1][2][3][4] has been extensively studied during the past two decades for low secondary electron yield [5][6][7] and their sorption properties toward many gases such as hydrogen, oxygen, nitrogen, carbon monoxide and dioxide. The sorption of these gases except H2 is not reversible and it causes a progressive contamination for TiZrV film [1,8,9].…”
Section: Introductionmentioning
confidence: 99%